Photoelectrochemical NADH regeneration is highly sensitive to the nature of electrode surface.


Journal

The Journal of chemical physics
ISSN: 1089-7690
Titre abrégé: J Chem Phys
Pays: United States
ID NLM: 0375360

Informations de publication

Date de publication:
14 Aug 2020
Historique:
entrez: 15 3 2022
pubmed: 14 8 2020
medline: 14 8 2020
Statut: ppublish

Résumé

(Photo)electrochemistry enables the synthesis of high-value fine chemicals and highly selective activation of molecules that are difficult to prepare using conventional chemical methods. In this work, light-driven NADH (reduced nicotinamide adenine dinucleotide) regeneration is achieved using a molecular Rh(III) mediator on Si photoelectrodes. This process is observed to be highly sensitive to the surface nature of Si photoelectrodes, exhibiting an overpotential reduction up to 600 mV on Si nanowires (SiNWs) as compared to planar Si. The use of a molecular mediator and SiNWs enables 100% selectivity toward NADH synthesis within a broad potential window. The origin of the striking difference is identified as the multifaceted nature of SiNWs.

Identifiants

pubmed: 35287463
doi: 10.1063/5.0016459
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

064703

Auteurs

Bingqing Zhang (B)

Department of Chemistry, Merkert Chemistry Center, Boston College, Chestnut Hill, Massachusetts 02467, USA.

Shaochen Xu (S)

Department of Chemistry, University of New Hampshire, Durham, New Hampshire 03824, USA.

Da He (D)

Department of Chemistry, Merkert Chemistry Center, Boston College, Chestnut Hill, Massachusetts 02467, USA.

Rong Chen (R)

Department of Chemistry, Merkert Chemistry Center, Boston College, Chestnut Hill, Massachusetts 02467, USA.

Yumin He (Y)

Department of Chemistry, Merkert Chemistry Center, Boston College, Chestnut Hill, Massachusetts 02467, USA.

Wenjun Fa (W)

Department of Chemistry, Merkert Chemistry Center, Boston College, Chestnut Hill, Massachusetts 02467, USA.

Gonghu Li (G)

Department of Chemistry, University of New Hampshire, Durham, New Hampshire 03824, USA.

Dunwei Wang (D)

Department of Chemistry, Merkert Chemistry Center, Boston College, Chestnut Hill, Massachusetts 02467, USA.

Classifications MeSH