Plasma-Enhanced Atomic Layer Deposition of HfO

HfO2 thin films high-reflective mirrors laser-induced damage threshold plasma-enhanced ALD substrate biasing tailoring material properties

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
30 Mar 2022
Historique:
pubmed: 22 3 2022
medline: 22 3 2022
entrez: 21 3 2022
Statut: ppublish

Résumé

Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine control over the material properties of functional coatings. The growth, structural, mechanical, and optical properties of HfO

Identifiants

DOI: 10.1021/acsami.1c21889 PMID: 35311275
pubmed: 35311275
doi: 10.1021/acsami.1c21889
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

14677-14692

Auteurs

Vivek Beladiya (V)

Institute of Applied Physics, Friedrich Schiller University Jena, Albert-Einstein Str. 15, 07745 Jena, Germany.
Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany.
ORCID: 0000-0002-8094-6300

Tahsin Faraz (T)

Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.

Paul Schmitt (P)

Institute of Applied Physics, Friedrich Schiller University Jena, Albert-Einstein Str. 15, 07745 Jena, Germany.
Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany.

Anne-Sophie Munser (AS)

Institute of Applied Physics, Friedrich Schiller University Jena, Albert-Einstein Str. 15, 07745 Jena, Germany.
Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany.

Sven Schröder (S)

Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany.

Sebastian Riese (S)

Layertec GmbH, Ernst-Abbe-Weg 1, 99441 Mellingen, Germany.

Christian Mühlig (C)

Leibniz-Institute of Photonic Technology, Albert-Einstein-Str. 9, 07745 Jena, Germany.

Daniel Schachtler (D)

RhySearch, Werdenbergstrasse 4, 9471 Buchs, Switzerland.

Fabian Steger (F)

RhySearch, Werdenbergstrasse 4, 9471 Buchs, Switzerland.

Roelene Botha (R)

RhySearch, Werdenbergstrasse 4, 9471 Buchs, Switzerland.

Felix Otto (F)

Institute of Solid State Physics, Friedrich Schiller University Jena, Helmholtzweg 5, 07743 Jena, Germany.
ORCID: 0000-0002-2327-5950

Torsten Fritz (T)

Institute of Solid State Physics, Friedrich Schiller University Jena, Helmholtzweg 5, 07743 Jena, Germany.
ORCID: 0000-0001-6904-1909

Christian van Helvoirt (C)

Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.

Wilhelmus M M Kessels (WMM)

Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.
ORCID: 0000-0002-7630-8226

Hassan Gargouri (H)

Sentech Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin, Germany.

Adriana Szeghalmi (A)

Institute of Applied Physics, Friedrich Schiller University Jena, Albert-Einstein Str. 15, 07745 Jena, Germany.
Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany.
ORCID: 0000-0003-2055-2825

Classifications MeSH