Synthesis of transition metal dichalcogenide van der Waals heterostructures through chemical vapor deposition.
chemical vapor deposition (CVD)
transition metal dichalcogenide (TMD)
van der Waals heterostructure
Journal
Journal of physics. Condensed matter : an Institute of Physics journal
ISSN: 1361-648X
Titre abrégé: J Phys Condens Matter
Pays: England
ID NLM: 101165248
Informations de publication
Date de publication:
25 Apr 2022
25 Apr 2022
Historique:
received:
20
12
2021
accepted:
31
03
2022
pubmed:
1
4
2022
medline:
1
4
2022
entrez:
31
3
2022
Statut:
epublish
Résumé
Transition metal dichalcogenide (TMD) van der Waals (vdW) heterostructures show great potential in the exploration of novel physical phenomena and practical applications. Compared to the traditional mechanical stacking techniques, chemical vapor deposition (CVD) method exhibits more advantages in preparing TMD vdW heterostructures. CVD enables the large-scale production of high-quality materials with clean interfaces in the future. Herein, CVD methods for the synthesis of TMD vdW heterostructures are summarized. These methods are categorized in two major strategies, multi-step process and one-step process. The effects of various factors are demonstrated, including the temperature, nucleation, and precursors. Finally, the remaining challenges are discussed.
Identifiants
pubmed: 35358958
doi: 10.1088/1361-648X/ac6309
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Informations de copyright
© 2022 IOP Publishing Ltd.