Transport Properties of Methyl-Terminated Germanane Microcrystallites.

germanane hydration methylation resistivity thermal robustness

Journal

Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216

Informations de publication

Date de publication:
29 Mar 2022
Historique:
received: 15 12 2021
revised: 13 03 2022
accepted: 22 03 2022
entrez: 12 4 2022
pubmed: 13 4 2022
medline: 13 4 2022
Statut: epublish

Résumé

Germanane is a two-dimensional material consisting of stacks of atomically thin germanium sheets. It's easy and low-cost synthesis holds promise for the development of atomic-scale devices. However, to become an electronic-grade material, high-quality layered crystals with good chemical purity and stability are needed. To this end, we studied the electrical transport of annealed methyl-terminated germanane microcrystallites in both high vacuum and ultrahigh vacuum. Scanning electron microscopy of crystallites revealed two types of behavior which arise from the difference in the crystallite chemistry. While some crystallites are hydrated and oxidized, preventing the formation of good electrical contact, the four-point resistance of oxygen-free crystallites was measured with multiple tips scanning tunneling microscopy, yielding a bulk transport with resistivity smaller than 1 Ω·cm. When normalized by the crystallite thickness, the resistance compares well with the resistance of hydrogen-passivated germanane flakes found in the literature. Along with the high purity of the crystallites, a thermal stability of the resistance at 280 °C makes methyl-terminated germanane suitable for complementary metal oxide semiconductor back-end-of-line processes.

Identifiants

pubmed: 35407246
pii: nano12071128
doi: 10.3390/nano12071128
pmc: PMC9000464
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : Agence Nationale de la Recherche
ID : ANR-17-CE09-0021-03; ANR-11-EQPX-0015
Organisme : United States Air Force Office of Scientific Research
ID : FA-9550-20-1-0018
Organisme : National Science Foundation
ID : DGE 1744592

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Auteurs

Davide Sciacca (D)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Maxime Berthe (M)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Bradley J Ryan (BJ)

Department of Chemical and Biological Engineering, Iowa State University, Ames, IA 50011, USA.

Nemanja Peric (N)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Dominique Deresmes (D)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Louis Biadala (L)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Christophe Boyaval (C)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Ahmed Addad (A)

UMR 8207-UMET-Unité Matériaux et Transformations, Université de Lille, CNRS, INRAE, Centrale Lille, 59000 Lille, France.

Ophélie Lancry (O)

HORIBA FRANCE SAS, 91120 Palaiseau, France.

Raghda Makarem (R)

HORIBA FRANCE SAS, 91120 Palaiseau, France.

Sébastien Legendre (S)

HORIBA FRANCE SAS, 91120 Palaiseau, France.

Didier Hocrelle (D)

HORIBA FRANCE SAS, 91120 Palaiseau, France.

Matthew G Panthani (MG)

Department of Chemical and Biological Engineering, Iowa State University, Ames, IA 50011, USA.

Geoffroy Prévot (G)

Institut des NanoSciences de Paris, CNRS, Université de Sorbonne, 75005 Paris, France.

Emmanuel Lhuillier (E)

Institut des NanoSciences de Paris, CNRS, Université de Sorbonne, 75005 Paris, France.

Pascale Diener (P)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Bruno Grandidier (B)

UMR 8520-IEMN, Université de Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia-ISEN, 59000 Lille, France.

Classifications MeSH