An analysis of Schottky barrier in silicene/Ga
Journal
Physical chemistry chemical physics : PCCP
ISSN: 1463-9084
Titre abrégé: Phys Chem Chem Phys
Pays: England
ID NLM: 100888160
Informations de publication
Date de publication:
04 May 2022
04 May 2022
Historique:
pubmed:
15
4
2022
medline:
15
4
2022
entrez:
14
4
2022
Statut:
epublish
Résumé
Two-dimensional materials are leading the way in nanodevice applications thanks to their various advantages. Although two-dimensional materials show promise for many applications, they have certain limitations. In the last decade, the increasing demand for the applications of novel two-dimensional materials has accelerated heterostructure studies in this field. Hence, restoring the combination of two-dimensional heterostructured materials has been reported. In this paper, we show that the effect of the external electric field and biaxial strain on the silicene/Ga
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM