An analysis of Schottky barrier in silicene/Ga


Journal

Physical chemistry chemical physics : PCCP
ISSN: 1463-9084
Titre abrégé: Phys Chem Chem Phys
Pays: England
ID NLM: 100888160

Informations de publication

Date de publication:
04 May 2022
Historique:
pubmed: 15 4 2022
medline: 15 4 2022
entrez: 14 4 2022
Statut: epublish

Résumé

Two-dimensional materials are leading the way in nanodevice applications thanks to their various advantages. Although two-dimensional materials show promise for many applications, they have certain limitations. In the last decade, the increasing demand for the applications of novel two-dimensional materials has accelerated heterostructure studies in this field. Hence, restoring the combination of two-dimensional heterostructured materials has been reported. In this paper, we show that the effect of the external electric field and biaxial strain on the silicene/Ga

Identifiants

pubmed: 35420606
doi: 10.1039/d2cp00228k
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

10210-10221

Auteurs

R Caglayan (R)

Department of Physics, Faculty of Science, Ankara University, 06100, Ankara, Turkey.

H E Guler (HE)

Department of Physics, Faculty of Science, Ankara University, 06100, Ankara, Turkey.

Y Mogulkoc (Y)

Department of Physics Engineering, Faculty of Engineering, Ankara University, 06100, Ankara, Turkey. mogulkoc@eng.ankara.edu.tr.

Classifications MeSH