Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp')
Journal
RSC advances
ISSN: 2046-2069
Titre abrégé: RSC Adv
Pays: England
ID NLM: 101581657
Informations de publication
Date de publication:
21 Jun 2021
21 Jun 2021
Historique:
received:
26
04
2021
accepted:
15
06
2021
entrez:
28
4
2022
pubmed:
29
4
2022
medline:
29
4
2022
Statut:
epublish
Résumé
Nickel oxide (NiO) has good optical transparency and wide band-gap, and due to the particular alignment of valence and conduction band energies with typical current collector materials has been used in solar cells as an efficient hole transport-electron blocking layer, where it is most commonly deposited
Identifiants
pubmed: 35480804
doi: 10.1039/d1ra03263a
pii: d1ra03263a
pmc: PMC9034214
doi:
Types de publication
Journal Article
Langues
eng
Pagination
22199-22205Informations de copyright
This journal is © The Royal Society of Chemistry.
Déclaration de conflit d'intérêts
There are no conflicts to declare.
Références
J Am Chem Soc. 2015 Jul 15;137(27):8696-9
pubmed: 26125203
Nat Mater. 2011 Nov 06;11(1):76-81
pubmed: 22057388
Acta Crystallogr A. 2008 Jan;64(Pt 1):112-22
pubmed: 18156677
J Appl Crystallogr. 2011 Dec 1;44(Pt 6):1259-1263
pubmed: 22199401
Chem Commun (Camb). 2018 May 31;54(45):5732-5735
pubmed: 29774895
Adv Mater. 2015 May 13;27(18):2930-7
pubmed: 25820687
Sensors (Basel). 2018 Mar 01;18(3):
pubmed: 29494504