Highly Tunable Carrier Tunneling in Vertical Graphene-WS
Fowler−Nordheim tunneling
direct tunneling
field-effect tunneling transistors
graphene van der Waals heterostructures
thermionic emission
Journal
ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589
Informations de publication
Date de publication:
24 May 2022
24 May 2022
Historique:
pubmed:
5
5
2022
medline:
5
5
2022
entrez:
4
5
2022
Statut:
ppublish
Résumé
Owing to the fascinating properties, the emergence of two-dimensional (2D) materials brings various important applications of electronic and optoelectronic devices from field-effect transistors (FETs) to photodetectors. As a zero-band-gap material, graphene has excellent electric conductivity and ultrahigh carrier mobility, while the ON/OFF ratio of the graphene FET is severely low. Semiconducting 2D transition metal chalcogenides (TMDCs) exhibit an appropriate band gap, realizing FETs with high ON/OFF ratio and compensating for the disadvantages of graphene transistors. However, a Schottky barrier often forms at the interface between the TMDC and metallic contact, which limits the on-state current of the devices. Here, we lift the two limits of the 2D-FET by demonstrating highly tunable field-effect tunneling transistors based on vertical graphene-WS
Identifiants
pubmed: 35506523
doi: 10.1021/acsnano.2c00536
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM