Highly Tunable Carrier Tunneling in Vertical Graphene-WS

Fowler−Nordheim tunneling direct tunneling field-effect tunneling transistors graphene van der Waals heterostructures thermionic emission

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
24 May 2022
Historique:
pubmed: 5 5 2022
medline: 5 5 2022
entrez: 4 5 2022
Statut: ppublish

Résumé

Owing to the fascinating properties, the emergence of two-dimensional (2D) materials brings various important applications of electronic and optoelectronic devices from field-effect transistors (FETs) to photodetectors. As a zero-band-gap material, graphene has excellent electric conductivity and ultrahigh carrier mobility, while the ON/OFF ratio of the graphene FET is severely low. Semiconducting 2D transition metal chalcogenides (TMDCs) exhibit an appropriate band gap, realizing FETs with high ON/OFF ratio and compensating for the disadvantages of graphene transistors. However, a Schottky barrier often forms at the interface between the TMDC and metallic contact, which limits the on-state current of the devices. Here, we lift the two limits of the 2D-FET by demonstrating highly tunable field-effect tunneling transistors based on vertical graphene-WS

Identifiants

pubmed: 35506523
doi: 10.1021/acsnano.2c00536
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

7880-7889

Auteurs

Zongqi Bai (Z)

College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, Hunan 410073, China.

Yang Xiao (Y)

College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, Hunan 410073, China.

Qing Luo (Q)

College of Arts and Science, National University of Defense Technology, Changsha, Hunan 410073, China.

Miaomiao Li (M)

College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, Hunan 410073, China.

Gang Peng (G)

College of Arts and Science, National University of Defense Technology, Changsha, Hunan 410073, China.

Zhihong Zhu (Z)

College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, Hunan 410073, China.

Fang Luo (F)

College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, Hunan 410073, China.

Mengjian Zhu (M)

College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, Hunan 410073, China.

Shiqiao Qin (S)

College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, Hunan 410073, China.

Kostya Novoselov (K)

Department of Materials Science and Engineering, National University of Singapore, Singapore 117575, Singapore.
Chongqing 2D Materials Institute, Liangjiang New Area, Chongqing 400714, China.

Classifications MeSH