Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation.


Journal

RSC advances
ISSN: 2046-2069
Titre abrégé: RSC Adv
Pays: England
ID NLM: 101581657

Informations de publication

Date de publication:
07 Oct 2019
Historique:
received: 10 09 2019
accepted: 30 09 2019
entrez: 9 5 2022
pubmed: 10 10 2019
medline: 10 10 2019
Statut: epublish

Résumé

Formation of precise and high-resolution silica micropatterns on polymer substrates is of importance in surface structuring for flexible device fabrication of optics, microelectronic, and biotechnology. To achieve that, substrates modified with affinity-patterns serve as a strategy for site-selective deposition. In the present paper, vacuum ultraviolet (VUV) treatment is utilized to achieve spatially-controlled surface functionalization on a cyclo-olefin polymer (COP) substrate. An organosilane, 2,4,6,8-tetramethylcyclotetrasiloxane (TMCTS), preferentially deposits on the functionalized regions. Well-defined patterns of TMCTS are formed with a minimum feature of ∼500 nm. The secondary VUV/(O)-treatment converts TMCTS into SiO

Identifiants

pubmed: 35530761
doi: 10.1039/c9ra07256j
pii: c9ra07256j
pmc: PMC9072887
doi:

Types de publication

Journal Article

Langues

eng

Pagination

32313-32322

Informations de copyright

This journal is © The Royal Society of Chemistry.

Déclaration de conflit d'intérêts

There are no conflicts to declare.

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Auteurs

Cheng-Tse Wu (CT)

Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.

Ahmed I A Soliman (AIA)

Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.
Chemistry Department, Faculty of Science, Assiut University Assiut 71516 Egypt.

Toru Utsunomiya (T)

Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.

Takashi Ichii (T)

Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.

Hiroyuki Sugimura (H)

Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.

Classifications MeSH