Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation.
Journal
RSC advances
ISSN: 2046-2069
Titre abrégé: RSC Adv
Pays: England
ID NLM: 101581657
Informations de publication
Date de publication:
07 Oct 2019
07 Oct 2019
Historique:
received:
10
09
2019
accepted:
30
09
2019
entrez:
9
5
2022
pubmed:
10
10
2019
medline:
10
10
2019
Statut:
epublish
Résumé
Formation of precise and high-resolution silica micropatterns on polymer substrates is of importance in surface structuring for flexible device fabrication of optics, microelectronic, and biotechnology. To achieve that, substrates modified with affinity-patterns serve as a strategy for site-selective deposition. In the present paper, vacuum ultraviolet (VUV) treatment is utilized to achieve spatially-controlled surface functionalization on a cyclo-olefin polymer (COP) substrate. An organosilane, 2,4,6,8-tetramethylcyclotetrasiloxane (TMCTS), preferentially deposits on the functionalized regions. Well-defined patterns of TMCTS are formed with a minimum feature of ∼500 nm. The secondary VUV/(O)-treatment converts TMCTS into SiO
Identifiants
pubmed: 35530761
doi: 10.1039/c9ra07256j
pii: c9ra07256j
pmc: PMC9072887
doi:
Types de publication
Journal Article
Langues
eng
Pagination
32313-32322Informations de copyright
This journal is © The Royal Society of Chemistry.
Déclaration de conflit d'intérêts
There are no conflicts to declare.
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