Nonlinear Temperature-Dependent Phonon Decay in Heavily Doped Silicon: Predominant Interferon-Mediated Cold Phonon Annihilation.


Journal

The journal of physical chemistry letters
ISSN: 1948-7185
Titre abrégé: J Phys Chem Lett
Pays: United States
ID NLM: 101526034

Informations de publication

Date de publication:
07 Jun 2022
Historique:
entrez: 7 6 2022
pubmed: 8 6 2022
medline: 8 6 2022
Statut: aheadofprint

Résumé

A nonlinear Fano interaction has been reported here which is manifest in terms of a parabolic temperature-dependent phonon decay process observable in terms of a Raman spectral parameter. Temperature-dependent Raman spectroscopic studies have been carried out on heavily and moderately doped crystalline silicon to investigate the behavior of anharmonic phonon decay in semiconductor systems where Fano interactions are present inherently. Systematic study reveals that in heavily doped systems an interferon-mediated decay route exists for cold phonons present at lower temperatures (<475 K) where Fano coupling is stronger and dominates over the typical multiple-phonon decay process. On the other hand, the anharmonic phonon decay remains the predominant process at higher temperatures irrespective of the doping level. Temperature-dependent phonon self-energy has been calculated using experimentally observed Raman line-shape parameters to validate the fact that the nonlinear decay of phonons through interferon mediation is a thermodynamically favorable process at low temperatures.

Identifiants

pubmed: 35670640
doi: 10.1021/acs.jpclett.2c01248
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

5232-5239

Auteurs

Chanchal Rani (C)

Materials and Device Laboratory, Department of Physics, Indian Institute of Technology Indore, Simrol 453552, India.

Manushree Tanwar (M)

Materials and Device Laboratory, Department of Physics, Indian Institute of Technology Indore, Simrol 453552, India.

Suchita Kandpal (S)

Materials and Device Laboratory, Department of Physics, Indian Institute of Technology Indore, Simrol 453552, India.

Tanushree Ghosh (T)

Materials and Device Laboratory, Department of Physics, Indian Institute of Technology Indore, Simrol 453552, India.

Love Bansal (L)

Materials and Device Laboratory, Department of Physics, Indian Institute of Technology Indore, Simrol 453552, India.

Rajesh Kumar (R)

Materials and Device Laboratory, Department of Physics, Indian Institute of Technology Indore, Simrol 453552, India.

Classifications MeSH