Nanohollow Titanium Oxide Structures on Ti/FTO Glass Formed by Step-Bias Anodic Oxidation for Photoelectrochemical Enhancement.
TiOx
anodic oxidation
nanohollows
photoelectrochemical
Journal
Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216
Informations de publication
Date de publication:
04 Jun 2022
04 Jun 2022
Historique:
received:
29
04
2022
revised:
27
05
2022
accepted:
02
06
2022
entrez:
10
6
2022
pubmed:
11
6
2022
medline:
11
6
2022
Statut:
epublish
Résumé
In this study, a new anodic oxidation with a step-bias increment is proposed to evaluate oxidized titanium (Ti) nanostructures on transparent fluorine-doped tin oxide (FTO) on glass. The optimal Ti thickness was determined to be 130 nm. Compared to the use of a conventional constant bias of 25 V, a bias ranging from 5 V to 20 V with a step size of 5 V for 3 min per period can be used to prepare a titanium oxide (TiO
Identifiants
pubmed: 35683780
pii: nano12111925
doi: 10.3390/nano12111925
pmc: PMC9182085
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : Linkou Chang Gung Memorial Hospital
ID : CMRPD2L0171
Organisme : Linkou Chang Gung Memorial Hospital
ID : CMRPD2I0012
Organisme : Linkou Chang Gung Memorial Hospital
ID : CMRPD2L0121
Organisme : Ministry of Science and Technology
ID : 108-2221-E-182-060-MY3
Organisme : Ministry of Science and Technology
ID : 108-2628-E-182-002-MY3
Organisme : Ministry of Science and Technology
ID : 110-2221-E-131-011
Organisme : Ministry of Science and Technology
ID : 111-2923-E-182-001-MY3
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