Synchrotron Radiation Study of Gain, Noise, and Collection Efficiency of GaAs SAM-APDs with Staircase Structure.

GaAs separate absorption multiplication avalanche photodiode (GaAs SAM-APD) X-ray photodetector collection efficiency staircase structure synchrotron radiation

Journal

Sensors (Basel, Switzerland)
ISSN: 1424-8220
Titre abrégé: Sensors (Basel)
Pays: Switzerland
ID NLM: 101204366

Informations de publication

Date de publication:
17 Jun 2022
Historique:
received: 05 05 2022
revised: 09 06 2022
accepted: 14 06 2022
entrez: 24 6 2022
pubmed: 25 6 2022
medline: 25 6 2022
Statut: epublish

Résumé

In hard X-ray applications that require high detection efficiency and short response times, such as synchrotron radiation-based Mössbauer absorption spectroscopy and time-resolved fluorescence or photon beam position monitoring, III-V-compound semiconductors, and dedicated alloys offer some advantages over the Si-based technologies traditionally used in solid-state photodetectors. Amongst them, gallium arsenide (GaAs) is one of the most valuable materials thanks to its unique characteristics. At the same time, implementing charge-multiplication mechanisms within the sensor may become of critical importance in cases where the photogenerated signal needs an intrinsic amplification before being acquired by the front-end electronics, such as in the case of a very weak photon flux or when single-photon detection is required. Some GaAs-based avalanche photodiodes (APDs) were grown by a molecular beam epitaxy to fulfill these needs; by means of band gap engineering, we realised devices with separate absorption and multiplication region(s) (SAM), the latter featuring a so-called staircase structure to reduce the multiplication noise. This work reports on the experimental characterisations of gain, noise, and charge collection efficiencies of three series of GaAs APDs featuring different thicknesses of the absorption regions. These devices have been developed to investigate the role of such thicknesses and the presence of traps or defects at the metal-semiconductor interfaces responsible for charge loss, in order to lay the groundwork for the future development of very thick GaAs devices (thicker than 100 μm) for hard X-rays. Several measurements were carried out on such devices with both lasers and synchrotron light sources, inducing photon absorption with X-ray microbeams at variable and controlled depths. In this way, we verified both the role of the thickness of the absorption region in the collection efficiency and the possibility of using the APDs without reaching the punch-through voltage, thus preventing the noise induced by charge multiplication in the absorption region. These devices, with thicknesses suitable for soft X-ray detection, have also shown good characteristics in terms of internal amplification and reduction of multiplication noise, in line with numerical simulations.

Identifiants

pubmed: 35746377
pii: s22124598
doi: 10.3390/s22124598
pmc: PMC9227164
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Références

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Auteurs

Matija Colja (M)

Department of Engineering and Architecture, University of Trieste, 34127 Trieste, Italy.

Marco Cautero (M)

Department of Engineering and Architecture, University of Trieste, 34127 Trieste, Italy.

Ralf Hendrik Menk (RH)

Elettra-Sincrotrone Trieste S.C.p.A., Area Science Park Basovizza, 34149 Trieste, Italy.
Istituto Nazionale di Fisica Nucleare Sezione di Trieste, 34127 Trieste, Italy.
Department of Medical Imaging, University of Saskatchewan, Saskatoon, SK S7N 5A2, Canada.

Pierpaolo Palestri (P)

Polytechnic Department of Engineering and Architecture, University of Udine, 33100 Udine, Italy.

Alessandra Gianoncelli (A)

Elettra-Sincrotrone Trieste S.C.p.A., Area Science Park Basovizza, 34149 Trieste, Italy.

Matias Antonelli (M)

Istituto Nazionale di Fisica Nucleare Sezione di Trieste, 34127 Trieste, Italy.

Giorgio Biasiol (G)

Laboratorio TASC, Area Science Park Basovizza, Consiglio Nazionale delle Ricerche-Istituto Officina dei Materiali, 34149 Trieste, Italy.

Simone Dal Zilio (S)

Laboratorio TASC, Area Science Park Basovizza, Consiglio Nazionale delle Ricerche-Istituto Officina dei Materiali, 34149 Trieste, Italy.

Tereza Steinhartova (T)

Laboratorio TASC, Area Science Park Basovizza, Consiglio Nazionale delle Ricerche-Istituto Officina dei Materiali, 34149 Trieste, Italy.

Camilla Nichetti (C)

Department of Physics, University of Trieste, 34127 Trieste, Italy.

Fulvia Arfelli (F)

Istituto Nazionale di Fisica Nucleare Sezione di Trieste, 34127 Trieste, Italy.
Department of Physics, University of Trieste, 34127 Trieste, Italy.

Dario De Angelis (D)

Elettra-Sincrotrone Trieste S.C.p.A., Area Science Park Basovizza, 34149 Trieste, Italy.

Francesco Driussi (F)

Polytechnic Department of Engineering and Architecture, University of Udine, 33100 Udine, Italy.

Valentina Bonanni (V)

Elettra-Sincrotrone Trieste S.C.p.A., Area Science Park Basovizza, 34149 Trieste, Italy.

Alessandro Pilotto (A)

Polytechnic Department of Engineering and Architecture, University of Udine, 33100 Udine, Italy.

Gianluca Gariani (G)

Elettra-Sincrotrone Trieste S.C.p.A., Area Science Park Basovizza, 34149 Trieste, Italy.

Sergio Carrato (S)

Department of Engineering and Architecture, University of Trieste, 34127 Trieste, Italy.

Giuseppe Cautero (G)

Elettra-Sincrotrone Trieste S.C.p.A., Area Science Park Basovizza, 34149 Trieste, Italy.
Istituto Nazionale di Fisica Nucleare Sezione di Trieste, 34127 Trieste, Italy.

Classifications MeSH