Top-Layer Engineering Reshapes Charge Transfer at Polar Oxide Interfaces.

charge-transfer phenomena double perovskites ferromagnetism oxide interfaces

Journal

Advanced materials (Deerfield Beach, Fla.)
ISSN: 1521-4095
Titre abrégé: Adv Mater
Pays: Germany
ID NLM: 9885358

Informations de publication

Date de publication:
Sep 2022
Historique:
revised: 12 07 2022
received: 05 04 2022
pubmed: 17 7 2022
medline: 17 7 2022
entrez: 16 7 2022
Statut: ppublish

Résumé

Charge-transfer phenomena at heterointerfaces are a promising pathway to engineer functionalities absent in bulk materials but can also lead to degraded properties in ultrathin films. Mitigating such undesired effects with an interlayer reshapes the interface architecture, restricting its operability. Therefore, developing less-invasive methods to control charge transfer will be beneficial. Here, an appropriate top-interface design allows for remote manipulation of the charge configuration of the buried interface and concurrent restoration of the ferromagnetic trait of the whole film. Double-perovskite insulating ferromagnetic La

Identifiants

pubmed: 35841137
doi: 10.1002/adma.202203071
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

e2203071

Subventions

Organisme : Swiss National Science Foundation
ID : PP00P2_170564
Pays : Switzerland
Organisme : Swiss National Science Foundation
ID : 206021_150784
Pays : Switzerland
Organisme : Swiss National Science Foundation
ID : 200021_178791
Pays : Switzerland
Organisme : Swiss National Science Foundation
ID : 206021_189625
Pays : Switzerland
Organisme : Swiss National Science Foundation
ID : 200021_169467
Pays : Switzerland
Organisme : Swiss National Science Foundation
ID : 51NF40-182892
Pays : Switzerland

Informations de copyright

© 2022 The Authors. Advanced Materials published by Wiley-VCH GmbH.

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Auteurs

Gabriele De Luca (G)

Department of Physics, University of Zurich, Winterthurerstrasse 190, Zurich, 8057, Switzerland.

Jonathan Spring (J)

Department of Physics, University of Zurich, Winterthurerstrasse 190, Zurich, 8057, Switzerland.

Moloud Kaviani (M)

Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern, Freiestrasse 3, Bern, 3012, Switzerland.

Simon Jöhr (S)

Department of Physics, University of Zurich, Winterthurerstrasse 190, Zurich, 8057, Switzerland.

Marco Campanini (M)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, 8600, Switzerland.

Anna Zakharova (A)

Swiss Light Source, Paul Scherrer Institut, Villigen, 5232, Switzerland.

Charles Guillemard (C)

ALBA Synchrotron Light Source, Carrer de la Llum 2-26, Cerdanyola del Vallès, 08290, Spain.

Javier Herrero-Martin (J)

ALBA Synchrotron Light Source, Carrer de la Llum 2-26, Cerdanyola del Vallès, 08290, Spain.

Rolf Erni (R)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, 8600, Switzerland.

Cinthia Piamonteze (C)

Swiss Light Source, Paul Scherrer Institut, Villigen, 5232, Switzerland.

Marta D Rossell (MD)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, 8600, Switzerland.

Ulrich Aschauer (U)

Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern, Freiestrasse 3, Bern, 3012, Switzerland.

Marta Gibert (M)

Department of Physics, University of Zurich, Winterthurerstrasse 190, Zurich, 8057, Switzerland.

Classifications MeSH