AC parallel local oxidation of silicon.
Journal
Nanoscale advances
ISSN: 2516-0230
Titre abrégé: Nanoscale Adv
Pays: England
ID NLM: 101738708
Informations de publication
Date de publication:
09 Oct 2019
09 Oct 2019
Historique:
received:
17
07
2019
accepted:
02
09
2019
entrez:
22
9
2022
pubmed:
3
9
2019
medline:
3
9
2019
Statut:
epublish
Résumé
Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiO
Identifiants
pubmed: 36132101
doi: 10.1039/c9na00445a
pii: c9na00445a
pmc: PMC9419026
doi:
Types de publication
Journal Article
Langues
eng
Pagination
3887-3891Informations de copyright
This journal is © The Royal Society of Chemistry.
Déclaration de conflit d'intérêts
There are no conflicts to declare.
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