On-site growth method of 3D structured multi-layered graphene on silicon nanowires.
Journal
Nanoscale advances
ISSN: 2516-0230
Titre abrégé: Nanoscale Adv
Pays: England
ID NLM: 101738708
Informations de publication
Date de publication:
15 Apr 2020
15 Apr 2020
Historique:
received:
05
02
2020
accepted:
22
03
2020
entrez:
22
9
2022
pubmed:
23
3
2020
medline:
23
3
2020
Statut:
epublish
Résumé
An experimental method is described in which a orderly 3D array of graphene sheets is grown to conform to the shape of an underlying nanowire (NW) substrate that remains on-site. The procedure uses a sacrificial nickel catalyst-based CVD growth process that is capable of producing graphene onto an insulating SiO
Identifiants
pubmed: 36132294
doi: 10.1039/d0na00098a
pii: d0na00098a
pmc: PMC9419803
doi:
Types de publication
Journal Article
Langues
eng
Pagination
1718-1725Informations de copyright
This journal is © The Royal Society of Chemistry.
Déclaration de conflit d'intérêts
There are no conflicts to declare.
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