Physical mechanisms involved in the formation and operation of memory devices based on a monolayer of gold nanoparticle-polythiophene hybrid materials.


Journal

Nanoscale advances
ISSN: 2516-0230
Titre abrégé: Nanoscale Adv
Pays: England
ID NLM: 101738708

Informations de publication

Date de publication:
10 Jul 2019
Historique:
received: 06 05 2019
accepted: 23 05 2019
entrez: 22 9 2022
pubmed: 24 5 2019
medline: 24 5 2019
Statut: epublish

Résumé

Understanding the physical and chemical mechanisms occurring during the forming process and operation of an organic resistive memory device is a requisite for better performance. Various mechanisms were suggested in vertically stacked memory structures, but the analysis remains indirect and needs destructive characterization (

Identifiants

pubmed: 36132737
doi: 10.1039/c9na00285e
pii: c9na00285e
pmc: PMC9417853
doi:

Types de publication

Journal Article

Langues

eng

Pagination

2718-2726

Informations de copyright

This journal is © The Royal Society of Chemistry.

Déclaration de conflit d'intérêts

There are no conflicts to declare.

Références

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Auteurs

T Zhang (T)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

D Guérin (D)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

F Alibart (F)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

D Troadec (D)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

D Hourlier (D)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

G Patriarche (G)

Centre for Nanoscience and Nanotechnology (C2N), CNRS, University of Paris-Saclay Route de Nozay, Marcoussis F-91460 France.

A Yassin (A)

MOLTECH-Anjou, CNRS, University of Angers 2 Bd Lavoisier Angers F-49045 France.

M Oçafrain (M)

MOLTECH-Anjou, CNRS, University of Angers 2 Bd Lavoisier Angers F-49045 France.

P Blanchard (P)

MOLTECH-Anjou, CNRS, University of Angers 2 Bd Lavoisier Angers F-49045 France.

J Roncali (J)

MOLTECH-Anjou, CNRS, University of Angers 2 Bd Lavoisier Angers F-49045 France.
Supramolecular Organic and Organometallic Chemistry Center Babes, Bolyai University 11 Arany Janos str 400028 Cluj-Napoca Romania.

D Vuillaume (D)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

K Lmimouni (K)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

S Lenfant (S)

Institute of Electronics Microelectronics and Nanotechnology (IEMN), CNRS, University of Lille Avenue Poincaré, F-59652 Villeneuve d'Ascq France stephane.lenfant@iemn.univ-lille1.fr.

Classifications MeSH