Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept.
ZnO
nanoarchitectonics
nanocrystals
optical coatings
photolithography
photoluminescence
Journal
Science and technology of advanced materials
ISSN: 1468-6996
Titre abrégé: Sci Technol Adv Mater
Pays: United States
ID NLM: 101614420
Informations de publication
Date de publication:
2022
2022
Historique:
entrez:
14
10
2022
pubmed:
15
10
2022
medline:
15
10
2022
Statut:
epublish
Résumé
Micro- and nanopatterning of metal oxide materials is an important process to develop electronic or optoelectronic devices. ZnO is a material of choice for its semiconducting and photoluminescence properties. In the frame of the nanoarchitectonics concept, we have developed and investigated a new process that relies on direct writing laser patterning in the Deep-UV (DUV) range to prepare photoluminescent microstructures of ZnO at room temperature, under air. This process is based on a synthesis of colloidal ZnO nanocrystals (NCs) with a careful choice of the ligands on the surface to obtain an optimal (i) stability of the colloids, (ii) redissolution of the non-insolated parts and (iii) cross-linking of the DUV-insolated parts. The mechanisms of photocrosslinking are studied by different spectroscopic methods. This room temperature process preserves the photoluminescence properties of the NCs and the wavelength used in DUV allows to reach a sub-micrometer resolution, which opens new perspectives for the integration of microstructures on flexible substrates for optoelectronic applications.
Identifiants
pubmed: 36238440
doi: 10.1080/14686996.2022.2116294
pii: 2116294
pmc: PMC9553187
doi:
Types de publication
Journal Article
Langues
eng
Pagination
535-546Informations de copyright
© 2022 The Author(s). Published by National Institute for Materials Science in partnership with Taylor & Francis Group.
Déclaration de conflit d'intérêts
No potential conflict of interest was reported by the author(s).
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