Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept.

ZnO nanoarchitectonics nanocrystals optical coatings photolithography photoluminescence

Journal

Science and technology of advanced materials
ISSN: 1468-6996
Titre abrégé: Sci Technol Adv Mater
Pays: United States
ID NLM: 101614420

Informations de publication

Date de publication:
2022
Historique:
entrez: 14 10 2022
pubmed: 15 10 2022
medline: 15 10 2022
Statut: epublish

Résumé

Micro- and nanopatterning of metal oxide materials is an important process to develop electronic or optoelectronic devices. ZnO is a material of choice for its semiconducting and photoluminescence properties. In the frame of the nanoarchitectonics concept, we have developed and investigated a new process that relies on direct writing laser patterning in the Deep-UV (DUV) range to prepare photoluminescent microstructures of ZnO at room temperature, under air. This process is based on a synthesis of colloidal ZnO nanocrystals (NCs) with a careful choice of the ligands on the surface to obtain an optimal (i) stability of the colloids, (ii) redissolution of the non-insolated parts and (iii) cross-linking of the DUV-insolated parts. The mechanisms of photocrosslinking are studied by different spectroscopic methods. This room temperature process preserves the photoluminescence properties of the NCs and the wavelength used in DUV allows to reach a sub-micrometer resolution, which opens new perspectives for the integration of microstructures on flexible substrates for optoelectronic applications.

Identifiants

pubmed: 36238440
doi: 10.1080/14686996.2022.2116294
pii: 2116294
pmc: PMC9553187
doi:

Types de publication

Journal Article

Langues

eng

Pagination

535-546

Informations de copyright

© 2022 The Author(s). Published by National Institute for Materials Science in partnership with Taylor & Francis Group.

Déclaration de conflit d'intérêts

No potential conflict of interest was reported by the author(s).

Références

Sci Technol Adv Mater. 2016 Aug 17;17(1):443-453
pubmed: 27877895
Nat Mater. 2016 Apr;15(4):383-96
pubmed: 27005918
J Am Chem Soc. 2011 Oct 5;133(39):15753-61
pubmed: 21848336
Science. 2009 Jun 12;324(5933):1417-20
pubmed: 19520953
J Am Chem Soc. 2003 Nov 26;125(47):14280-1
pubmed: 14624568
Sci Technol Adv Mater. 2019 Jan 31;20(1):51-95
pubmed: 30787960
Science. 2022 Mar 25;375(6587):1422-1426
pubmed: 35324292
Chemphyschem. 2006 Nov 13;7(11):2392-7
pubmed: 17051655
J Am Chem Soc. 2002 Mar 13;124(10):2305-11
pubmed: 11878985
Nat Mater. 2003 Mar;2(3):145-50
pubmed: 12612669
Nature. 2000 Oct 26;407(6807):981-3
pubmed: 11069172
Angew Chem Int Ed Engl. 2019 Nov 25;58(48):17163-17168
pubmed: 31482605
Nano Lett. 2021 Sep 22;21(18):7609-7616
pubmed: 34478618
Small. 2006 Aug;2(8-9):944-61
pubmed: 17193149
Science. 2017 Jul 28;357(6349):385-388
pubmed: 28751606
Adv Mater. 2018 Dec;30(50):e1800923
pubmed: 30073719
Nanoscale Horiz. 2021 May 4;6(5):364-378
pubmed: 33949390
Science. 2016 Aug 26;353(6302):
pubmed: 27563099

Auteurs

Quentin Kirscher (Q)

Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France.
Université de Strasbourg, Strasbourg, France.

Samar Hajjar-Garreau (S)

Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France.
Université de Strasbourg, Strasbourg, France.

Fabien Grasset (F)

CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), National Institute for Materials Science (NIMS), Tsukuba, Japan.
Université Rennes, CNRS, ISCR, UMR6226, Rennes, France.

Dominique Berling (D)

Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France.
Université de Strasbourg, Strasbourg, France.

Olivier Soppera (O)

Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France.
Université de Strasbourg, Strasbourg, France.

Classifications MeSH