Skyrmions Under Control-FIB Irradiation as a Versatile Tool for Skyrmion Circuits.
focused ion beam
magnetic thin-films
skyrmionics
skyrmions
spintronics
Journal
Advanced materials (Deerfield Beach, Fla.)
ISSN: 1521-4095
Titre abrégé: Adv Mater
Pays: Germany
ID NLM: 9885358
Informations de publication
Date de publication:
Jan 2023
Jan 2023
Historique:
revised:
11
10
2022
received:
11
08
2022
pubmed:
19
10
2022
medline:
19
10
2022
entrez:
18
10
2022
Statut:
ppublish
Résumé
Magnetic data storage and processing offer certain advances over conventional technologies, amongst which nonvolatility and low power operation are the most outstanding ones. Skyrmions are a promising candidate as a magnetic data carrier. However, the sputtering of skyrmion films and the control of the skyrmion nucleation, motion, and annihilation remains challenging. This work demonstrates that using optimized focused ion beam irradiation and annealing protocols enables the skyrmion phase in W/CoFeB/MgO thin films to be accessed easily. By analyzing ion-beam-engineered skyrmion hosting wires, excited by sub-100 ns current pulses, possibilities to control skyrmion nucleation, guide their motion, and control their annihilation unfold. Overall, the key elements needed to develop extensive skyrmion networks are presented.
Identifiants
pubmed: 36255142
doi: 10.1002/adma.202207321
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
e2207321Subventions
Organisme : Deutsche Forschungsgemeinschaft
ID : SPP2137
Organisme : Deutsche Forschungsgemeinschaft
ID : BE4641/2-1
Organisme : Deutsche Forschungsgemeinschaft
ID : ID403505866
Informations de copyright
© 2022 The Authors. Advanced Materials published by Wiley-VCH GmbH.
Références
A. N. Bogdanov, C. Panagopoulos, Nat. Rev. Phys. 2020, 2, 492.
A. Fert, N. Reyren, V. Cros, Nat. Rev. Mater. 2017, 2, 17031.
N. Kanazawa, S. Seki, Y. Tokura, Adv. Mater. 2017, 29, 1603227.
L. Peng, R. Takagi, W. Koshibae, K. Shibata, K. Nakajima, T.-H. Arima, N. Nagaosa, S. Seki, X. Yu, Y. Tokura, Nat. Nanotechnol. 2020, 15, 181.
Y. Wu, B. Francisco, Z. Chen, W. Wang, Y. Zhang, C. Wan, X. Han, H. Chi, Y. Hou, A. Lodesani, G. Yin, K. Liu, Y.-t. Cui, K. L. Wang, J. S. Moodera, Adv. Mater. 2022, 34, 2110583.
B. Ding, Z. Li, G. Xu, H. Li, Z. Hou, E. Liu, X. Xi, F. Xu, Y. Yao, W. Wang, Nano Lett. 2019, 20, 868.
W. Legrand, D. Maccariello, N. Reyren, K. Garcia, C. Moutafis, C. Moreau-Luchaire, S. Collin, K. Bouzehouane, V. Cros, A. Fert, Nano Lett. 2017, 17, 2703.
G. Yu, P. Upadhyaya, X. Li, W. Li, S. K. Kim, Y. Fan, K. L. Wong, Y. Tserkovnyak, P. K. Amiri, K. L. Wang, Nano Lett. 2016, 16, 1981.
M. Chauwin, X. Hu, F. Garcia-Sanchez, N. Betrabet, A. Paler, C. Moutafis, J. S. Friedman, Phys. Rev. Appl. 2019, 12, 064053.
Y. Huang, W. Kang, X. Zhang, Y. Zhou, W. Zhao, Nanotechnology 2017, 28, 08LT02.
X. Zhang, M. Ezawa, Y. Zhou, Sci. Rep. 2015, 5, 9400.
L. Gnoli, F. Riente, M. Vacca, M. Ruo Roch, M. Graziano, Electronics 2021, 10, 155.
J. Zhou, J. Chen, Adv. Electron. Mater. 2021, 7, 2100465.
T. Srivastava, W. Lim, I. Joumard, S. Auffret, C. Baraduc, H. Béa, Phys. Rev. B 2019, 100, 220401.
J. A. Brock, E. E. Fullerton, Adv. Mater. Interfaces 2022, 9, 2101708.
Q. Yang, Y. Cheng, Y. Li, Z. Zhou, J. Liang, X. Zhao, Z. Hu, R. Peng, H. Yang, M. Liu, Adv. Electron. Mater. 2020, 6, 2000246.
J. Fassbender, J. McCord, J. Magn. Magn. Mater. 2008, 320, 579.
X. Zhao, B. Zhang, N. Vernier, X. Zhang, M. Sall, T. Xing, L. H. Diez, C. Hepburn, L. Wang, G. Durin, A. Casiraghi, M. Belmeguenai, Y. Roussigné, A. Stashkevich, S. M. Chérif, J. Langer, B. Ocker, S. Jaiswal, G. Jakob, M. Kläui, W. Zhao, D. Ravelosona, Appl. Phys. Lett. 2019, 115, 122404.
L. Herrera Diez, F. García-Sánchez, J.-P. Adam, T. Devolder, S. Eimer, M. El Hadri, A. Lamperti, R. Mantovan, B. Ocker, D. Ravelosona, Appl. Phys. Lett. 2015, 107, 032401.
H. Shi, M. Li, S. Fang, W. Zhou, C. Yang, Y. Jiang, D. Wang, G. Yu, Surf. Interface Anal. 2018, 50, 59.
Y.-H. Wang, W.-C. Chen, S.-Y. Yang, K.-H. Shen, C. Park, M.-J. Kao, M.-J. Tsai, J. Appl. Phys. 2006, 99, 08M307.
M. C. De Jong, M. J. Meijer, J. Lucassen, J. Van Liempt, H. J. Swagten, B. Koopmans, R. Lavrijsen, Phys. Rev. B 2022, 105, 064429.
W. Ruane, S. White, J. Brangham, K. Meng, D. Pelekhov, F. Yang, P. Hammel, AIP Adv. 2018, 8, 056007.
R. Juge, K. Bairagi, K. G. Rana, J. Vogel, M. Sall, D. Mailly, V. T. Pham, Q. Zhang, N. Sisodia, M. Foerster, L. Aballe, M. Belmeguenai, Y. Roussign, S. Auffret, L. D. Buda-Prejbeanu, G. Gaudin, D. Ravelosona, O. Boulle, Nano Lett. 2021, 21, 2989.
Y. Guang, Y. Peng, Z. Yan, Y. Liu, J. Zhang, X. Zeng, S. Zhang, S. Zhang, D. M. Burn, N. Jaouen, J. Wei, H. Xu, J. Feng, C. Fang, G. van der Laan, T. Hesjedal, B. Cui, X. Zhang, G. Yu, X. Han, Adv. Mater. 2020, 32, 2003003.
K. Garello, F. Yasin, H. Hody, S. Couet, L. Souriau, S. H. Sharifi, J. Swerts, R. Carpenter, S. Rao, W. Kim, J. Wu, K. K. V. Sethu, M. Pak, N. Jossart, D. Crotti, A. Furnémont, G. S. Kar imec, in 2019 Symp. on VLSI Circuits, IEEE, Piscataway, NJ, USA 2019, pp. T194-T195.
K. Fallon, S. Hughes, K. Zeissler, W. Legrand, F. Ajejas, D. Maccariello, S. McFadzean, W. Smith, D. McGrouther, S. Collin, N. Reyren, V. Cros, C. H. Marrows, S. McVitie, Small 2020, 16, 1907450.
L.-M. Kern, B. Pfau, V. Deinhart, M. Schneider, C. Klose, K. Gerlinger, S. Wittrock, D. Engel, I. Will, C. M. Günther, K. Litzius, S. Wintz, M. Weigand, F. Büttner, S. Eisebitt, Nano Lett. 2022, 106, 054435.
M. Yamanouchi, A. Jander, P. Dhagat, S. Ikeda, F. Matsukura, H. Ohno, IEEE Magn. Lett. 2011, 2, 3000304.
S. Mendisch, F. Riente, V. Ahrens, L. Gnoli, M. Haider, M. Opel, M. Kiechle, M. R. Roch, M. Becherer, Phys. Rev. Appl. 2021, 16, 014039.
T. Devolder, I. Barisic, S. Eimer, K. Garcia, J.-P. Adam, B. Ockert, D. Ravelosona, J. Appl. Phys. 2013, 113, 203912.
L. H. Diez, M. Voto, A. Casiraghi, M. Belmeguenai, Y. Roussigné, G. Durin, A. Lamperti, R. Mantovan, V. Sluka, V. Jeudy, Y. T. Liu, A. Stashkevich, S. M. Chérif, J. Langer, B. Ocker, L. Lopez-Diaz, D. Ravelosona, Phys. Rev. B 2019, 99, 054431.
J. Wu, J. Choi, C. Won, Y. Wu, A. Scholl, A. Doran, C. Hwang, Z. Qiu, Phys. Rev. B 2009, 79, 014429.
S. Rohart, A. Thiaville, Phys. Rev. B 2013, 88, 184422.
M. Hervé, B. Dupé, R. Lopes, M. Böttcher, M. D. Martins, T. Balashov, L. Gerhard, J. Sinova, W. Wulfhekel, Nat. Commun. 2018, 9, 1015.
V. Ahrens, L. Gnoli, D. Giuliano, S. Mendisch, M. Kiechle, F. Riente, M. Becherer, AIP Adv. 2022, 12, 035325.
J.-Y. Tinevez, N. Perry, J. Schindelin, G. M. Hoopes, G. D. Reynolds, E. Laplantine, S. Y. Bednarek, S. L. Shorte, K. W. Eliceiri, Methods 2017, 115, 80.
X. Wang, H. Yuan, X. Wang, Commun. Phys. 2018, 1, 31.
A. Soumyanarayanan, M. Raju, A. Gonzalez Oyarce, A. K. Tan, M.-Y. Im, A. Petrović, P. Ho, K. Khoo, M. Tran, C. Gan, F. Ernult, C. Panagopoulos, Nat. Mater. 2017, 16, 898.
N. Romming, A. Kubetzka, C. Hanneken, K. von Bergmann, R. Wiesendanger, Phys. Rev. Lett. 2015, 114, 177203.
C. Moreau-Luchaire, C. Moutafis, N. Reyren, J. Sampaio, C. Vaz, N. Van Horne, K. Bouzehouane, K. Garcia, C. Deranlot, P. Warnicke, P. Wohlhüter, J.-M. George, M. Weigand, J. Raabe, V. Cros, A. Fert, Nat. Nanotechnol. 2016, 11, 444.
H. T. Nembach, E. Jué, K. Poetzger, J. Fassbender, T. J. Silva, J. M. Shaw, J. Appl. Phys. 2022, 131, 143901.
A. Casiraghi, H. Corte-León, M. Vafaee, F. Garcia-Sanchez, G. Durin, M. Pasquale, G. Jakob, M. Kläui, O. Kazakova, Commun. Phys. 2019, 2, 145.
J. Müller, A. Rosch, Phys. Rev. B 2015, 91, 054410.
I. Lima Fernandes, J. Bouaziz, S. Blügel, S. Lounis, Nat. Commun. 2018, 9, 4395.
P. Upadhyaya, G. Yu, P. K. Amiri, K. L. Wang, Phys. Rev. B 2015, 92, 134411.
J. Liang, J. Yu, J. Chen, M. Qin, M. Zeng, X. Lu, X. Gao, J.-M. Liu, New J. Phys. 2018, 20, 053037.
X. Zhang, G. Zhao, H. Fangohr, J. P. Liu, W. Xia, J. Xia, F. Morvan, Sci. Rep. 2015, 5, 7643.
R. Duine, Nat. Nanotechnol. 2013, 8, 800.
W. Jiang, X. Zhang, G. Yu, W. Zhang, X. Wang, M. B. Jungfleisch, J. E. Pearson, X. Cheng, O. Heinonen, K. L. Wang, Y. Zhou, A. Hoffmann, S. G. E. te Velthuis, Nat. Phys. 2017, 13, 162.
K. Everschor-Sitte, M. Sitte, T. Valet, A. Abanov, J. Sinova, New J. Phys. 2017, 19, 092001.
F. Büttner, I. Lemesh, M. Schneider, B. Pfau, C. M. Günther, P. Hessing, J. Geilhufe, L. Caretta, D. Engel, B. Krüger, J. Viefhaus, S. Eisebitt, G. S. D. Beach, Nat. Nanotechnol. 2017, 12, 1040.
W. R. Hunter, IEEE Trans. Electron Devices 1997, 44, 304.
F. Riente, S. Mendisch, L. Gnoli, V. Ahrens, M. R. Roch, M. Becherer, AIP Adv. 2020, 10, 125229.
S. Breitkreutz, J. Kiermaier, I. Eichwald, X. Ju, G. Csaba, D. Schmitt-Landsiedel, M. Becherer, IEEE Trans. Magn. 2012, 48, 4336.
L. Flacke, V. Ahrens, S. Mendisch, L. Körber, T. Böttcher, E. Meidinger, M. Yaqoob, M. Müller, L. Liensberger, A. Kákay, M. Becherer, P. Pirro, M. Althammer, S. Geprägs, H. Huebl, R. Gross, M. Weiler, Phys. Rev. B 2021, 104, L100417.
A. Hrabec, J. Sampaio, M. Belmeguenai, I. Gross, R. Weil, S. M. Chérif, A. Stashkevich, V. Jacques, A. Thiaville, S. Rohart, Nat. Commun. 2017, 8, 15765.
D. Pinna, G. Bourianoff, K. Everschor-Sitte, Phys. Rev. Appl. 2020, 14, 054020.
Y. Jibiki, M. Goto, E. Tamura, J. Cho, S. Miki, R. Ishikawa, H. Nomura, T. Srivastava, W. Lim, S. Auffret, C. Baraduc, H. Bea, Y. Suzuki, Appl. Phys. Lett. 2020, 117, 082402.
R. Hyndman, P. Warin, J. Gierak, J. Ferré, J. Chapman, J. Jamet, V. Mathet, C. Chappert, J. Appl. Phys. 2001, 90, 3843.
J. F. Ziegler, J. P. Biersack, in Treatise on Heavy-Ion Science, Springer, Berlin/Heidelberg, Germany 1985, pp. 93-129.