Dynamical criticality of spin-shear coupling in van der Waals antiferromagnets.


Journal

Nature communications
ISSN: 2041-1723
Titre abrégé: Nat Commun
Pays: England
ID NLM: 101528555

Informations de publication

Date de publication:
03 Nov 2022
Historique:
received: 15 06 2022
accepted: 21 10 2022
entrez: 4 11 2022
pubmed: 5 11 2022
medline: 5 11 2022
Statut: epublish

Résumé

The interplay between a multitude of electronic, spin, and lattice degrees of freedom underlies the complex phase diagrams of quantum materials. Layer stacking in van der Waals (vdW) heterostructures is responsible for exotic electronic and magnetic properties, which inspires stacking control of two-dimensional magnetism. Beyond the interplay between stacking order and interlayer magnetism, we discover a spin-shear coupling mechanism in which a subtle shear of the atomic layers can have a profound effect on the intralayer magnetic order in a family of vdW antiferromagnets. Using time-resolved X-ray diffraction and optical linear dichroism measurements, interlayer shear is identified as the primary structural degree of freedom that couples with magnetic order. The recovery times of both shear and magnetic order upon optical excitation diverge at the magnetic ordering temperature with the same critical exponent. The time-dependent Ginzburg-Landau theory shows that this concurrent critical slowing down arises from a linear coupling of the interlayer shear to the magnetic order, which is dictated by the broken mirror symmetry intrinsic to the monoclinic stacking. Our results highlight the importance of interlayer shear in ultrafast control of magnetic order via spin-mechanical coupling.

Identifiants

pubmed: 36329063
doi: 10.1038/s41467-022-34376-5
pii: 10.1038/s41467-022-34376-5
pmc: PMC9633802
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

6598

Subventions

Organisme : DOE | SC | Basic Energy Sciences (BES)
ID : DE-SC0012509

Informations de copyright

© 2022. The Author(s).

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Auteurs

Faran Zhou (F)

X-ray Science Division, Argonne National Laboratory, Lemont, IL, USA.

Kyle Hwangbo (K)

Department of Physics, University of Washington, Seattle, WA, USA.

Qi Zhang (Q)

X-ray Science Division, Argonne National Laboratory, Lemont, IL, USA.
Department of Physics, University of Washington, Seattle, WA, USA.
Department of Physics, Nanjing University, Nanjing, China.

Chong Wang (C)

Department of Materials Science and Engineering, University of Washington, Seattle, WA, USA.

Lingnan Shen (L)

Department of Physics, University of Washington, Seattle, WA, USA.

Jiawei Zhang (J)

X-ray Science Division, Argonne National Laboratory, Lemont, IL, USA.

Qianni Jiang (Q)

Department of Physics, University of Washington, Seattle, WA, USA.

Alfred Zong (A)

Department of Chemistry, University of California Berkeley, Berkeley, CA, USA.

Yifan Su (Y)

Department of Physics, Massachusetts Institute of Technology, Cambridge, MA, USA.

Marc Zajac (M)

X-ray Science Division, Argonne National Laboratory, Lemont, IL, USA.

Youngjun Ahn (Y)

X-ray Science Division, Argonne National Laboratory, Lemont, IL, USA.
Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA.

Donald A Walko (DA)

X-ray Science Division, Argonne National Laboratory, Lemont, IL, USA.

Richard D Schaller (RD)

Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL, USA.

Jiun-Haw Chu (JH)

Department of Physics, University of Washington, Seattle, WA, USA.

Nuh Gedik (N)

Department of Physics, Massachusetts Institute of Technology, Cambridge, MA, USA.

Xiaodong Xu (X)

Department of Physics, University of Washington, Seattle, WA, USA.
Department of Materials Science and Engineering, University of Washington, Seattle, WA, USA.

Di Xiao (D)

Department of Physics, University of Washington, Seattle, WA, USA.
Department of Materials Science and Engineering, University of Washington, Seattle, WA, USA.

Haidan Wen (H)

X-ray Science Division, Argonne National Laboratory, Lemont, IL, USA. wen@anl.gov.
Materials Science Division, Argonne National Laboratory, Lemont, IL, USA. wen@anl.gov.

Classifications MeSH