A Low Temperature Growth of Cu
HTL layer
chemical vapor deposition
hybrid perovskite
Journal
Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929
Informations de publication
Date de publication:
04 Nov 2022
04 Nov 2022
Historique:
received:
06
10
2022
revised:
31
10
2022
accepted:
02
11
2022
entrez:
11
11
2022
pubmed:
12
11
2022
medline:
12
11
2022
Statut:
epublish
Résumé
Copper oxide thin films have been successfully synthesized through a metal-organic chemical vapor deposition (MOCVD) approach starting from the copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate), Cu(tmhd)
Identifiants
pubmed: 36363379
pii: ma15217790
doi: 10.3390/ma15217790
pmc: PMC9657906
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : Italian Ministry of University and Scientific Research (MIUR)
ID : PON ARS01_00519
Déclaration de conflit d'intérêts
The authors declare no conflict of interest.
Références
Phys Chem Chem Phys. 2022 Sep 21;24(36):21549-21566
pubmed: 36065836
Nano Lett. 2015 Jun 10;15(6):3723-8
pubmed: 25938881
Dalton Trans. 2020 Oct 6;49(38):13317-13325
pubmed: 32940296
Inorg Chem. 2005 Oct 3;44(20):7226-33
pubmed: 16180887
Materials (Basel). 2018 Jul 20;11(7):
pubmed: 30037000
Sci Rep. 2021 Apr 8;11(1):7788
pubmed: 33833295
Angew Chem Int Ed Engl. 2016 Nov 14;55(47):14522-14545
pubmed: 27739653
Science. 2015 Nov 20;350(6263):944-8
pubmed: 26516198
Phys Chem Chem Phys. 2015 Oct 28;17(40):26892-902
pubmed: 26399423
ACS Appl Mater Interfaces. 2020 Mar 18;12(11):12972-12981
pubmed: 32083458
Dalton Trans. 2018 Jul 31;47(30):10002-10016
pubmed: 29916515
Dalton Trans. 2017 Feb 21;46(8):2670-2679
pubmed: 28170011