Synergistic Approach of Interfacial Layer Engineering and READ-Voltage Optimization in HfO
Journal
ACS applied electronic materials
ISSN: 2637-6113
Titre abrégé: ACS Appl Electron Mater
Pays: United States
ID NLM: 101734996
Informations de publication
Date de publication:
22 Nov 2022
22 Nov 2022
Historique:
received:
27
07
2022
accepted:
20
09
2022
entrez:
28
11
2022
pubmed:
29
11
2022
medline:
29
11
2022
Statut:
ppublish
Résumé
This article reports an improvement in the performance of the hafnium oxide-based (HfO
Identifiants
pubmed: 36439397
doi: 10.1021/acsaelm.2c00771
pmc: PMC9686141
doi:
Types de publication
Journal Article
Langues
eng
Pagination
5292-5300Informations de copyright
© 2022 from Fraunhofer-Gesellschaft (CNT, Fraunhofer IPMS). Published by American Chemical Society.
Déclaration de conflit d'intérêts
The authors declare no competing financial interest.
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