Putting High-Index Cu on the Map for High-Yield, Dry-Transferred CVD Graphene.
2D material
CVD
data science
dry transfer
graphene
high electron mobility
single crystal
Journal
ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589
Informations de publication
Date de publication:
03 Jan 2023
03 Jan 2023
Historique:
entrez:
3
1
2023
pubmed:
4
1
2023
medline:
4
1
2023
Statut:
aheadofprint
Résumé
Reliable, clean transfer and interfacing of 2D material layers are technologically as important as their growth. Bringing both together remains a challenge due to the vast, interconnected parameter space. We introduce a fast-screening descriptor approach to demonstrate holistic data-driven optimization across the entirety of process steps for the graphene-Cu model system. We map the crystallographic dependences of graphene chemical vapor deposition, interfacial Cu oxidation to decouple graphene, and its dry delamination across inverse pole figures. Their overlay enables us to identify hitherto unexplored (168) higher index Cu orientations as overall optimal orientations. We show the effective preparation of such Cu orientations via epitaxial close-space sublimation and achieve mechanical transfer with a very high yield (>95%) and quality of graphene domains, with room-temperature electron mobilities in the range of 40000 cm
Identifiants
pubmed: 36594782
doi: 10.1021/acsnano.2c09253
pmc: PMC9878973
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
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