Unraveling the impact of nano-scaling on silicon field-effect transistors for the detection of single-molecules.


Journal

Nanoscale
ISSN: 2040-3372
Titre abrégé: Nanoscale
Pays: England
ID NLM: 101525249

Informations de publication

Date de publication:
02 Feb 2023
Historique:
pubmed: 17 1 2023
medline: 17 1 2023
entrez: 16 1 2023
Statut: epublish

Résumé

Electrolyte-gated silicon field-effect transistors (FETs) capable of detecting single molecules could enable high-throughput molecular sensing chips to advance, for example, genomics or proteomics. For solid-gated silicon FETs it is well-known that nano-scaled devices become sensitive to single elementary charges near the silicon-oxide interface. However, in electrolyte-gated FETs, electrolyte screening strongly reduces sensitivity to charges near the gate oxide. The question arises whether nano-scaling electrolyte-gated FETs can entail a sufficiently large signal-to-noise ratio (SNR) for the detection of single molecules. We enhanced a technology computer-aided design tool with electrolyte screening models to calculate the impact of the FET geometry on the single-molecule signal and FET noise. Our continuum FET model shows that a sufficiently large single-molecule SNR is only obtained when nano-scaling all FET channel dimensions. Moreover, we show that the expected scaling trend of the single-molecule SNR breaks down and no longer results in improvements for geometries approaching the decananometer size. This is the characteristic size of the FET channel region modulated by a typical molecule. For gate lengths below 50 nm, the overlap of the modulated region with the highly conductive junctions leads to saturation of the SNR. For cross-sections below 10-30 nm, SNR degrades due to the overlap of the modulated region with the convex FET corners where a larger local gate capacitance reduces charge sensitivity. In our study, assuming a commercial solid-state FET noise amplitude, we find that a suspended nanowire FET architecture with 35 nm length and 5 × 10 nm

Identifiants

pubmed: 36644797
doi: 10.1039/d2nr05267a
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

2354-2368

Auteurs

Sybren Santermans (S)

imec, Kapeldreef 75, 3001 Leuven, Belgium. sybren.santermans@imec.be.
Department of Materials Engineering, University of Leuven, Kasteelpark Arenberg 44, 3001 Leuven, Belgium.

Geert Hellings (G)

imec, Kapeldreef 75, 3001 Leuven, Belgium. sybren.santermans@imec.be.

Marc Heyns (M)

imec, Kapeldreef 75, 3001 Leuven, Belgium. sybren.santermans@imec.be.
Department of Materials Engineering, University of Leuven, Kasteelpark Arenberg 44, 3001 Leuven, Belgium.

Willem Van Roy (W)

imec, Kapeldreef 75, 3001 Leuven, Belgium. sybren.santermans@imec.be.

Koen Martens (K)

imec, Kapeldreef 75, 3001 Leuven, Belgium. sybren.santermans@imec.be.

Classifications MeSH