Metasurface-Enabled Holographic Lithography for Impact-Absorbing Nanoarchitected Sheets.

holographic lithography nanoarchitectures optical metasurfaces

Journal

Advanced materials (Deerfield Beach, Fla.)
ISSN: 1521-4095
Titre abrégé: Adv Mater
Pays: Germany
ID NLM: 9885358

Informations de publication

Date de publication:
Mar 2023
Historique:
revised: 30 11 2022
received: 04 10 2022
medline: 18 1 2023
pubmed: 18 1 2023
entrez: 17 1 2023
Statut: ppublish

Résumé

Nanoarchitected materials represent a class of structural meta-materials that utilze nanoscale features to achieve unconventional material properties such as ultralow density and high energy absorption. A dearth of fabrication methods capable of producing architected materials with sub-micrometer resolution over large areas in a scalable manner exists. A fabrication technique is presented that employs holographic patterns generated by laser exposure of phase metasurface masks in negative-tone photoresists to produce 30-40 µm-thick nanoarchitected sheets with 2.1 × 2.4 cm

Identifiants

pubmed: 36649979
doi: 10.1002/adma.202209153
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

e2209153

Subventions

Organisme : Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung
ID : P400P2_194371
Organisme : nFugue

Informations de copyright

© 2023 Wiley-VCH GmbH.

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Auteurs

Matias Kagias (M)

Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA.
Kavli Nanoscience Institute, Caltech, Pasadena, CA, 91125, USA.

Seola Lee (S)

Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA.

Andrew C Friedman (AC)

Kavli Nanoscience Institute, Caltech, Pasadena, CA, 91125, USA.
Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA, 91125, USA.

Tianzhe Zheng (T)

Kavli Nanoscience Institute, Caltech, Pasadena, CA, 91125, USA.
Thomas J. Watson, Sr., Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA, 91125, USA.

David Veysset (D)

Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA.

Andrei Faraon (A)

Kavli Nanoscience Institute, Caltech, Pasadena, CA, 91125, USA.
Thomas J. Watson, Sr., Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA, 91125, USA.

Julia R Greer (JR)

Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, 91125, USA.
Kavli Nanoscience Institute, Caltech, Pasadena, CA, 91125, USA.

Classifications MeSH