Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography.
block copolymers
directed self-assembly
kinetics
lithography
nanofabrication
thin film stability
wetting
Journal
Nanotechnology
ISSN: 1361-6528
Titre abrégé: Nanotechnology
Pays: England
ID NLM: 101241272
Informations de publication
Date de publication:
13 Feb 2023
13 Feb 2023
Historique:
received:
17
06
2022
accepted:
19
01
2023
pubmed:
20
1
2023
medline:
20
1
2023
entrez:
19
1
2023
Statut:
epublish
Résumé
In this work, we investigated the self-assembly of a lamellar block copolymer (BCP) under different wetting conditions. We explored the influence of the chemical composition of under-layers and top-coats on the thin film stability, self-assembly kinetics and BCP domain orientation. Three different chemistries were chosen for these surface affinity modifiers and their composition was tuned in order to provide either neutral wetting (i.e. an out-of-plane lamellar structure), or affine wetting conditions (i.e. an in-plane lamellar structure) with respect to a sub-10 nm PS-
Identifiants
pubmed: 36657158
doi: 10.1088/1361-6528/acb49f
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Informations de copyright
© 2023 IOP Publishing Ltd.