Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives.
PS-b-PMMA
block copolymer lithography
ionic liquid
line edge roughness (LER)
reactive ion etching
Journal
Nanotechnology
ISSN: 1361-6528
Titre abrégé: Nanotechnology
Pays: England
ID NLM: 101241272
Informations de publication
Date de publication:
06 Mar 2023
06 Mar 2023
Historique:
received:
07
10
2022
accepted:
29
01
2023
pubmed:
30
1
2023
medline:
30
1
2023
entrez:
29
1
2023
Statut:
epublish
Résumé
Polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) is one of the most widely studied block copolymers for direct self-assembly because of its excellent compatibility with traditional processes. However, pattern transfer of PS-b-PMMA block copolymers (BCPs) remains a great challenge for its applications due to the insufficient etching resolution. In this study, the effect of ionic liquid 1-hexyl-3-methylimidazolium hexafluorophosphate (HMHF) additives on the line edge roughness (LER) performances of PS-b-PMMA self-assembled patterns was studied. Trace addition of HMHF kept the photolithography compatibility of PS-b-PMMA block copolymer films, but obviously increased their Flory-Huggins interaction parameter (
Identifiants
pubmed: 36709513
doi: 10.1088/1361-6528/acb6df
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Informations de copyright
© 2023 IOP Publishing Ltd.