Increased Light Extraction of Thin-Film Flip-Chip UVB LEDs by Surface Texturing.


Journal

ACS photonics
ISSN: 2330-4022
Titre abrégé: ACS Photonics
Pays: United States
ID NLM: 101634366

Informations de publication

Date de publication:
15 Feb 2023
Historique:
received: 30 08 2022
entrez: 23 2 2023
pubmed: 24 2 2023
medline: 24 2 2023
Statut: epublish

Résumé

Ultraviolet light-emitting diodes (LEDs) suffer from a low wall-plug efficiency, which is to a large extent limited by the poor light extraction efficiency (LEE). A thin-film flip-chip (TFFC) design with a roughened N-polar AlGaN surface can substantially improve this. We here demonstrate an enabling technology to realize TFFC LEDs emitting in the UVB range (280-320 nm), which includes standard LED processing in combination with electrochemical etching to remove the substrate. The integration of the electrochemical etching is achieved by epitaxial sacrificial and etch block layers in combination with encapsulation of the LED. The LEE was enhanced by around 25% when the N-polar AlGaN side of the TFFC LEDs was chemically roughened, reaching an external quantum efficiency of 2.25%. By further optimizing the surface structure, our ray-tracing simulations predict a higher LEE from the TFFC LEDs than flip-chip LEDs and a resulting higher wall-plug efficiency.

Identifiants

pubmed: 36820322
doi: 10.1021/acsphotonics.2c01352
pmc: PMC9936579
doi:

Types de publication

Journal Article

Langues

eng

Pagination

368-373

Informations de copyright

© 2023 The Authors. Published by American Chemical Society.

Déclaration de conflit d'intérêts

The authors declare no competing financial interest.

Références

Opt Express. 2018 Mar 5;26(5):5111-5117
pubmed: 29529718
Opt Express. 2019 Aug 5;27(16):A1074-A1083
pubmed: 31510492
Opt Express. 2019 Oct 14;27(21):29930-29937
pubmed: 31684248
Sci Rep. 2022 Feb 16;12(1):2591
pubmed: 35173171

Auteurs

Michael A Bergmann (MA)

Chalmers University of Technology, Department of Microtechnology and Nanoscience, 41296Gothenburg, Sweden.

Johannes Enslin (J)

Technische Universität Berlin, Institute of Solid State Physics, 10623Berlin, Germany.

Martin Guttmann (M)

Technische Universität Berlin, Institute of Solid State Physics, 10623Berlin, Germany.

Luca Sulmoni (L)

Technische Universität Berlin, Institute of Solid State Physics, 10623Berlin, Germany.

Neysha Lobo Ploch (NL)

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik, 12489Berlin, Germany.

Filip Hjort (F)

Chalmers University of Technology, Department of Microtechnology and Nanoscience, 41296Gothenburg, Sweden.

Tim Kolbe (T)

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik, 12489Berlin, Germany.

Tim Wernicke (T)

Technische Universität Berlin, Institute of Solid State Physics, 10623Berlin, Germany.

Michael Kneissl (M)

Technische Universität Berlin, Institute of Solid State Physics, 10623Berlin, Germany.
Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik, 12489Berlin, Germany.

Åsa Haglund (Å)

Chalmers University of Technology, Department of Microtechnology and Nanoscience, 41296Gothenburg, Sweden.

Classifications MeSH