Origin of the Critical Thickness in Improper Ferroelectric Thin Films.

YMnO3 critical thickness electron energy loss spectroscopy improper ferroelectricity interfaces oxygen vacancies transmission electron microscopy

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
12 Apr 2023
Historique:
medline: 31 3 2023
pubmed: 31 3 2023
entrez: 30 3 2023
Statut: ppublish

Résumé

Improper ferroelectrics are expected to be more robust than conventional ferroelectrics against depolarizing field effects and to exhibit a much-desired absence of critical thickness. Recent studies, however, revealed the loss of ferroelectric response in epitaxial improper ferroelectric thin films. Here, we investigate improper ferroelectric hexagonal YMnO

Identifiants

pubmed: 36996320
doi: 10.1021/acsami.3c00412
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

18482-18492

Auteurs

Alexander Vogel (A)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.
Department of Materials, Eidgenössische Technische Hochschule Zürich, 8092 Zürich, Switzerland.

Alicia Ruiz Caridad (A)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.

Johanna Nordlander (J)

Department of Materials, Eidgenössische Technische Hochschule Zürich, 8092 Zürich, Switzerland.
Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.

Martin F Sarott (MF)

Department of Materials, Eidgenössische Technische Hochschule Zürich, 8092 Zürich, Switzerland.

Quintin N Meier (QN)

Université Grenoble Alpes, CNRS, Institut Néel, 38042 Grenoble, France.

Rolf Erni (R)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.

Nicola A Spaldin (NA)

Department of Materials, Eidgenössische Technische Hochschule Zürich, 8092 Zürich, Switzerland.

Morgan Trassin (M)

Department of Materials, Eidgenössische Technische Hochschule Zürich, 8092 Zürich, Switzerland.

Marta D Rossell (MD)

Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.

Classifications MeSH