Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography.
EUV
HHG
Inspection
Multilayer mirror
Ptychography
Journal
Ultramicroscopy
ISSN: 1879-2723
Titre abrégé: Ultramicroscopy
Pays: Netherlands
ID NLM: 7513702
Informations de publication
Date de publication:
Jul 2023
Jul 2023
Historique:
received:
05
12
2022
revised:
08
03
2023
accepted:
14
03
2023
medline:
3
4
2023
pubmed:
3
4
2023
entrez:
2
4
2023
Statut:
ppublish
Résumé
Ptychography is a lensless imaging technique that is aberration-free and capable of imaging both the amplitude and the phase of radiation reflected or transmitted from an object using iterative algorithms. Working with extreme ultraviolet (EUV) light, ptychography can provide better resolution than conventional optical microscopy and deeper penetration than scanning electron microscope. As a compact lab-scale EUV light sources, high harmonic generation meets the high coherence requirement of ptychography and gives more flexibilities in both budget and experimental time compared to synchrotrons. The ability to measure phase makes reflection-mode ptychography a good choice for characterising both the surface topography and the internal structural changes in EUV multilayer mirrors. This paper describes the use of reflection-mode ptychography with a lab-scale high harmonic generation based EUV light source to perform quantitative measurement of the amplitude and phase reflection from EUV multilayer mirrors with engineered substrate defects. Using EUV light at 29.6nm from a tabletop high harmonic generation light source, a lateral resolution down to ∼88nm and a phase resolution of 0.08rad (equivalent to topographic height variation of 0.27nm) are achieved. The effect of surface distortion and roughness on EUV reflectivity is compared to topographic properties of the mirror defects measured using both atomic force microscopy and scanning transmission electron microscopy. Modelling of reflection properties from multilayer mirrors is used to predict the potential of a combination of on-resonance, actinic ptychographic imaging at 13.5nm and atomic force microscopy for characterising the changes in multilayered structures.
Identifiants
pubmed: 37004492
pii: S0304-3991(23)00037-2
doi: 10.1016/j.ultramic.2023.113720
pii:
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
113720Informations de copyright
Copyright © 2023. Published by Elsevier B.V.
Déclaration de conflit d'intérêts
Declaration of Competing Interest The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.