Uncovering polar vortex structures by inversion of multiple scattering with a stacked Bloch wave model.

4D-STEM Electron diffraction Nanobeam electron diffraction Scanning transmission electron microscopy

Journal

Ultramicroscopy
ISSN: 1879-2723
Titre abrégé: Ultramicroscopy
Pays: Netherlands
ID NLM: 7513702

Informations de publication

Date de publication:
Aug 2023
Historique:
received: 10 11 2022
revised: 21 03 2023
accepted: 03 04 2023
medline: 24 4 2023
pubmed: 24 4 2023
entrez: 23 04 2023
Statut: ppublish

Résumé

Nanobeam electron diffraction can probe local structural properties of complex crystalline materials including phase, orientation, tilt, strain, and polarization. Ideally, each diffraction pattern from a projected area of a few unit cells would produce a clear Bragg diffraction pattern, where the reciprocal lattice vectors can be measured from the spacing of the diffracted spots, and the spot intensities are equal to the square of the structure factor amplitudes. However, many samples are too thick for this simple interpretation of their diffraction patterns, as multiple scattering of the electron beam can produce a highly nonlinear relationship between the spot intensities and the underlying structure. Here, we develop a stacked Bloch wave method to model the diffracted intensities from thick samples with structure that varies along the electron beam. Our method reduces the large parameter space of electron scattering to just a few structural variables per probe position, making it fast enough to apply to very large fields of view. We apply our method to SrTiO

Identifiants

pubmed: 37087909
pii: S0304-3991(23)00049-9
doi: 10.1016/j.ultramic.2023.113732
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

113732

Informations de copyright

Copyright © 2023 The Authors. Published by Elsevier B.V. All rights reserved.

Déclaration de conflit d'intérêts

Declaration of Competing Interest The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Auteurs

Steven E Zeltmann (SE)

Department of Materials Science and Engineering, University of California, Berkeley, CA, United States of America. Electronic address: steven.zeltmann@berkeley.edu.

Shang-Lin Hsu (SL)

Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, United States of America.

Hamish G Brown (HG)

Ian Holmes Imaging Centre, Bio21 Molecular Science and Biotechnology Institute, University of Melbourne, Victoria, Australia.

Sandhya Susarla (S)

School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, AZ, United States of America.

Ramamoorthy Ramesh (R)

Department of Materials Science and Engineering, University of California, Berkeley, CA, United States of America.

Andrew M Minor (AM)

Department of Materials Science and Engineering, University of California, Berkeley, CA, United States of America; National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, United States of America.

Colin Ophus (C)

National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, United States of America. Electronic address: cophus@gmail.com.

Classifications MeSH