Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.
atomic layer deposition
hardness
mechanical properties
modulus
nanoindentation
refractive index
thin film
Journal
Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216
Informations de publication
Date de publication:
10 May 2023
10 May 2023
Historique:
received:
14
04
2023
revised:
08
05
2023
accepted:
09
05
2023
medline:
27
5
2023
pubmed:
27
5
2023
entrez:
27
5
2023
Statut:
epublish
Résumé
Coatings with tunable refractive index and high mechanical resilience are useful in optical systems. In this work, thin films of HfO
Identifiants
pubmed: 37242023
pii: nano13101607
doi: 10.3390/nano13101607
pmc: PMC10223527
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : Estonian Research Agency
ID : PRG4
Organisme : European Regional Development Fund
ID : TK134
Organisme : European Regional Development Fund
ID : 2014-2020.4.01.16-0123
Références
ACS Appl Mater Interfaces. 2012 Oct 24;4(10):5360-8
pubmed: 22947770
ACS Nano. 2013 Aug 27;7(8):7041-52
pubmed: 23898781