Approaching the Intrinsic Properties of Moiré Structures Using Atomic Force Microscopy Ironing.

atomic force microscopy heterostructures interlayer exciton photoluminescence transition metal dichalcogenides

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
14 Jun 2023
Historique:
medline: 5 6 2023
pubmed: 5 6 2023
entrez: 5 6 2023
Statut: ppublish

Résumé

Stacking monolayers of transition metal dichalcogenides (TMDs) has led to the discovery of a plethora of new exotic phenomena, resulting from moiré pattern formation. Due to the atomic thickness and high surface-to-volume ratio of heterostructures, the interfaces play a crucial role. Fluctuations in the interlayer distance affect interlayer coupling and moiré effects. Therefore, to access the intrinsic properties of the TMD stack, it is essential to obtain a clean and uniform interface between the layers. Here, we show that this is achieved by ironing with the tip of an atomic force microscope. This post-stacking procedure dramatically improves the homogeneity of the interfaces, which is reflected in the optical response of the interlayer exciton. We demonstrate that ironing improves the layer coupling, enhancing moiré effects and reducing disorder. This is crucial for the investigation of TMD heterostructure physics, which currently suffers from low reproducibility.

Identifiants

pubmed: 37276177
doi: 10.1021/acs.nanolett.2c04765
pmc: PMC10273312
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

4749-4755

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Auteurs

Swaroop Kumar Palai (SK)

Laboratoire National des Champs Magnétiques Intenses, EMFL, CNRS UPR 3228, Université Toulouse, Université Toulouse 3, INSA-T, 31400 Toulouse, France.

Mateusz Dyksik (M)

Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wrocław University of Science and Technology, 50-370 Wrocław, Poland.

Nikodem Sokolowski (N)

Laboratoire National des Champs Magnétiques Intenses, EMFL, CNRS UPR 3228, Université Toulouse, Université Toulouse 3, INSA-T, 31400 Toulouse, France.

Mariusz Ciorga (M)

Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wrocław University of Science and Technology, 50-370 Wrocław, Poland.

Estrella Sánchez Viso (E)

Materials Science Factory, Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid E-28049, Spain.

Yong Xie (Y)

Materials Science Factory, Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid E-28049, Spain.

Alina Schubert (A)

Materials Science Factory, Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid E-28049, Spain.

Takashi Taniguchi (T)

International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Ibaraki 305-004, Japan.

Kenji Watanabe (K)

Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Ibaraki 305-004, Japan.

Duncan K Maude (DK)

Laboratoire National des Champs Magnétiques Intenses, EMFL, CNRS UPR 3228, Université Toulouse, Université Toulouse 3, INSA-T, 31400 Toulouse, France.

Alessandro Surrente (A)

Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wrocław University of Science and Technology, 50-370 Wrocław, Poland.

Michał Baranowski (M)

Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wrocław University of Science and Technology, 50-370 Wrocław, Poland.

Andres Castellanos-Gomez (A)

Materials Science Factory, Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid E-28049, Spain.

Carmen Munuera (C)

Materials Science Factory, Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid E-28049, Spain.

Paulina Plochocka (P)

Laboratoire National des Champs Magnétiques Intenses, EMFL, CNRS UPR 3228, Université Toulouse, Université Toulouse 3, INSA-T, 31400 Toulouse, France.

Classifications MeSH