EXAFS REXS atomic occupancies atomic positions inserexs resonant elastic X-ray scattering thin films

Journal

Journal of applied crystallography
ISSN: 0021-8898
Titre abrégé: J Appl Crystallogr
Pays: United States
ID NLM: 9876190

Informations de publication

Date de publication:
01 Jun 2023
Historique:
received: 07 12 2022
accepted: 07 03 2023
medline: 7 6 2023
pubmed: 7 6 2023
entrez: 7 6 2023
Statut: epublish

Résumé

This paper presents

Identifiants

pubmed: 37284260
doi: 10.1107/S1600576723002212
pii: S1600576723002212
pmc: PMC10241054
doi:

Types de publication

Journal Article

Langues

eng

Pagination

854-859

Informations de copyright

© Antonio Peña Corredor et al. 2023.

Références

Sci Adv. 2016 May 27;2(5):e1600192
pubmed: 27386545
ACS Omega. 2020 Aug 25;5(35):22614-22620
pubmed: 32923821
Nat Commun. 2018 Jan 12;9(1):178
pubmed: 29330508
Inorg Chem. 2013 Nov 18;52(22):13269-77
pubmed: 24180301
J Synchrotron Radiat. 2014 Nov;21(Pt 6):1247-51
pubmed: 25343791
J Phys Condens Matter. 2015 May 8;27(17):175001
pubmed: 25765433
Rep Prog Phys. 2013 May;76(5):056502
pubmed: 23563216
Chem Rev. 2001 Jun;101(6):1843-67
pubmed: 11710001
J Phys Condens Matter. 2009 Aug 26;21(34):345501
pubmed: 21715786
Sci Rep. 2019 Mar 12;9(1):4225
pubmed: 30862877

Auteurs

Antonio Peña Corredor (A)

Université de Strasbourg, CNRS, IPCMS, UMR 7504, 23 rue du Loess, Strasbourg 67200, France.

Nathalie Viart (N)

Université de Strasbourg, CNRS, IPCMS, UMR 7504, 23 rue du Loess, Strasbourg 67200, France.

Christophe Lefevre (C)

Université de Strasbourg, CNRS, IPCMS, UMR 7504, 23 rue du Loess, Strasbourg 67200, France.

Classifications MeSH