Emerging SiC Applications beyond Power Electronic Devices.

MEMS biomedical devices detectors high temperature devices photonics silicon carbide

Journal

Micromachines
ISSN: 2072-666X
Titre abrégé: Micromachines (Basel)
Pays: Switzerland
ID NLM: 101640903

Informations de publication

Date de publication:
06 Jun 2023
Historique:
received: 17 04 2023
revised: 29 05 2023
accepted: 30 05 2023
medline: 28 6 2023
pubmed: 28 6 2023
entrez: 28 6 2023
Statut: epublish

Résumé

In recent years, several new applications of SiC (both 4H and 3C polytypes) have been proposed in different papers. In this review, several of these emerging applications have been reported to show the development status, the main problems to be solved and the outlooks for these new devices. The use of SiC for high temperature applications in space, high temperature CMOS, high radiation hard detectors, new optical devices, high frequency MEMS, new devices with integrated 2D materials and biosensors have been extensively reviewed in this paper. The development of these new applications, at least for the 4H-SiC ones, has been favored by the strong improvement in SiC technology and in the material quality and price, due to the increasing market for power devices. However, at the same time, these new applications need the development of new processes and the improvement of material properties (high temperature packages, channel mobility and threshold voltage instability improvement, thick epitaxial layers, low defects, long carrier lifetime, low epitaxial doping). Instead, in the case of 3C-SiC applications, several new projects have developed material processes to obtain more performing MEMS, photonics and biomedical devices. Despite the good performance of these devices and the potential market, the further development of the material and of the specific processes and the lack of several SiC foundries for these applications are limiting further development in these fields.

Identifiants

pubmed: 37374785
pii: mi14061200
doi: 10.3390/mi14061200
pmc: PMC10300968
pii:
doi:

Types de publication

Journal Article Review

Langues

eng

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Auteurs

Francesco La Via (F)

CNR-IMM, Strada VIII, 5, 95121 Catania, Italy.

Daniel Alquier (D)

GREMAN, UMR 7347, Université de Tours, CNRS, 37071 Tours, France.

Filippo Giannazzo (F)

CNR-IMM, Strada VIII, 5, 95121 Catania, Italy.

Tsunenobu Kimoto (T)

Department of Electronic Science and Engineering, Kyoto University, Nishikyo, Kyoto 615-8510, Japan.

Philip Neudeck (P)

NASA Glenn Research Center, 21000 Brookpark Rd., Cleveland, OH 44135, USA.

Haiyan Ou (H)

Department of Electrical and Photonics Engineering, Technical University of Denmark, Ørsteds Plads, Building 343, DK-2800 Kgs. Lyngby, Denmark.

Stephen E Saddow (SE)

Electrical Engineering Department, University of South Florida, 4202 E. Fowler Avenue, ENG 030, Tampa, FL 33620, USA.

Salvatore Tudisco (S)

INFN-LNS, Via Santa Sofia 62, 95124 Catania, Italy.

Classifications MeSH