In Situ H-Radical Surface Treatment on Aluminum Gallium Nitride for High-Performance Aluminum Gallium Nitride/Gallium Nitride MIS-HEMTs Fabrication.

AlGaN/GaN C–V frequency dispersion MIS-HEMTs current collapse dynamic on-resistance in situ H-radical treatment interface traps pulse-mode stress

Journal

Micromachines
ISSN: 2072-666X
Titre abrégé: Micromachines (Basel)
Pays: Switzerland
ID NLM: 101640903

Informations de publication

Date de publication:
21 Jun 2023
Historique:
received: 07 05 2023
revised: 16 06 2023
accepted: 19 06 2023
medline: 29 7 2023
pubmed: 29 7 2023
entrez: 29 7 2023
Statut: epublish

Résumé

In this work, we demonstrated a low current collapse normally on Al

Identifiants

pubmed: 37512589
pii: mi14071278
doi: 10.3390/mi14071278
pmc: PMC10385801
pii:
doi:

Types de publication

Journal Article

Langues

eng

Références

ACS Appl Mater Interfaces. 2021 Feb 17;13(6):7725-7734
pubmed: 33529524
Micromachines (Basel). 2021 Sep 27;12(10):
pubmed: 34683210
Micromachines (Basel). 2021 Nov 25;12(12):
pubmed: 34945290

Auteurs

Yannan Yang (Y)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Rong Fan (R)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Penghao Zhang (P)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Luyu Wang (L)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Maolin Pan (M)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Qiang Wang (Q)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Xinling Xie (X)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Saisheng Xu (S)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Chen Wang (C)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Chunlei Wu (C)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Min Xu (M)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Jian Jin (J)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

David Wei Zhang (DW)

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.

Classifications MeSH