Stimuli-Responsive Surface Ligands for Direct Lithography of Functional Inorganic Nanomaterials.


Journal

Accounts of chemical research
ISSN: 1520-4898
Titre abrégé: Acc Chem Res
Pays: United States
ID NLM: 0157313

Informations de publication

Date de publication:
05 Sep 2023
Historique:
medline: 8 8 2023
pubmed: 8 8 2023
entrez: 8 8 2023
Statut: ppublish

Résumé

ConspectusColloidal nanocrystals (NCs) have emerged as a diverse class of materials with tunable composition, size, shape, and surface chemistry. From their facile syntheses to unique optoelectronic properties, these solution-processed nanomaterials are a promising alternative to materials grown as bulk crystals or by vapor-phase methods. However, the integration of colloidal nanomaterials in real-world devices is held back by challenges in making patterned NC films with the resolution, throughput, and cost demanded by device components and applications. Therefore, suitable approaches to pattern NCs need to be established to aid the transition from individual proof-of-concept NC devices to integrated and multiplexed technological systems.In this Account, we discuss the development of stimuli-sensitive surface ligands that enable NCs to be patterned directly with good pattern fidelity while retaining desirable properties. We focus on rationally selected ligands that enable changes in the NC dispersibility by responding to light, electron beam, and/or heat. First, we summarize the fundamental forces between colloidal NCs and discuss the principles behind NC stabilization/destabilization. These principles are applied to understanding the mechanisms of the NC dispersibility change upon stimuli-induced ligand modifications. Six ligand-based patterning mechanisms are introduced: ligand cross-linking, ligand decomposition, ligand desorption,

Identifiants

pubmed: 37552212
doi: 10.1021/acs.accounts.3c00226
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

2286-2297

Auteurs

Jia-Ahn Pan (JA)

Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.
Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Himchan Cho (H)

Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea.

Igor Coropceanu (I)

Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.

Haoqi Wu (H)

Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.

Dmitri V Talapin (DV)

Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States.

Classifications MeSH