Fabrication of Specimens for Atom Probe Tomography Using a Combined Gallium and Neon Focused Ion Beam Milling Approach.

atom probe tomography focused ion beam gas field ionization source neon ions

Journal

Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
ISSN: 1435-8115
Titre abrégé: Microsc Microanal
Pays: England
ID NLM: 9712707

Informations de publication

Date de publication:
29 Sep 2023
Historique:
received: 18 02 2023
revised: 19 05 2023
accepted: 16 07 2023
pubmed: 16 8 2023
medline: 16 8 2023
entrez: 16 8 2023
Statut: ppublish

Résumé

We demonstrate a new focused ion beam sample preparation method for atom probe tomography. The key aspect of the new method is that we use a neon ion beam for the final tip-shaping after conventional annulus milling using gallium ions. This dual-ion approach combines the benefits of the faster milling capability of the higher current gallium ion beam with the chemically inert and higher precision milling capability of the noble gas neon ion beam. Using a titanium-aluminum alloy and a layered aluminum/aluminum-oxide tunnel junction sample as test cases, we show that atom probe tips prepared using the combined gallium and neon ion approach are free from the gallium contamination that typically frustrates composition analysis of these materials due to implantation, diffusion, and embrittlement effects. We propose that by using a focused ion beam from a noble gas species, such as the neon ions demonstrated here, atom probe tomography can be more reliably performed on a larger range of materials than is currently possible using conventional techniques.

Identifiants

pubmed: 37584510
pii: 7243071
doi: 10.1093/micmic/ozad078
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

1628-1638

Informations de copyright

© The Author(s) 2023. Published by Oxford University Press on behalf of the Microscopy Society of America. All rights reserved. For permissions, please e-mail: journals.permissions@oup.com.

Déclaration de conflit d'intérêts

Conflict of Interest At the time of this research, two of the authors (J.A.N., D.X.) were employed by Carl Zeiss, Inc., which manufactures the ORION NanoFab product used in this research.

Auteurs

Frances I Allen (FI)

Department of Materials Science and Engineering, UC Berkeley, Berkeley, CA 94720, USA.
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.

Paul T Blanchard (PT)

Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO 80305, USA.

Russell Lake (R)

Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO 80305, USA.

David Pappas (D)

Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO 80305, USA.

Deying Xia (D)

Carl Zeiss SMT Inc., Danvers, MA 01923, USA.

John A Notte (JA)

Carl Zeiss SMT Inc., Danvers, MA 01923, USA.

Ruopeng Zhang (R)

Department of Materials Science and Engineering, UC Berkeley, Berkeley, CA 94720, USA.
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.

Andrew M Minor (AM)

Department of Materials Science and Engineering, UC Berkeley, Berkeley, CA 94720, USA.
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.

Norman A Sanford (NA)

Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO 80305, USA.

Classifications MeSH