The shield-like nano-sized Si

Li metal batteries Lithium dendrites Long-term stability Si(3)N(4)-based interlayer Si(3)N(4)-derived compound shield

Journal

Journal of colloid and interface science
ISSN: 1095-7103
Titre abrégé: J Colloid Interface Sci
Pays: United States
ID NLM: 0043125

Informations de publication

Date de publication:
15 Dec 2023
Historique:
received: 09 07 2023
revised: 07 08 2023
accepted: 11 08 2023
medline: 18 8 2023
pubmed: 18 8 2023
entrez: 17 8 2023
Statut: ppublish

Résumé

The unrestrained Li dendrite growth impedes the performance of Li metal batteries (LMBs) and brings safety concerns. To mitigate the unfavorable effect of Li dendrites, in this work, a shield-like artificial interlayer composed of Si

Identifiants

pubmed: 37591083
pii: S0021-9797(23)01564-3
doi: 10.1016/j.jcis.2023.08.080
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

50-56

Informations de copyright

Copyright © 2023 Elsevier Inc. All rights reserved.

Déclaration de conflit d'intérêts

Declaration of Competing Interest The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Auteurs

Ziqin Liu (Z)

School of Materials Science and Engineering & Hubei Key Laboratory of Plasma Chemistry and Advanced Materials, Wuhan Institute of Technology, Wuhan 430205, China.

Xiaowei Wu (X)

School of Materials Science and Engineering & Hubei Key Laboratory of Plasma Chemistry and Advanced Materials, Wuhan Institute of Technology, Wuhan 430205, China.

Pu Hu (P)

School of Materials Science and Engineering & Hubei Key Laboratory of Plasma Chemistry and Advanced Materials, Wuhan Institute of Technology, Wuhan 430205, China.

Chaoqun Shang (C)

School of Materials Science and Engineering & Hubei Key Laboratory of Plasma Chemistry and Advanced Materials, Wuhan Institute of Technology, Wuhan 430205, China. Electronic address: chaoqun.shang@foxmail.com.

Classifications MeSH