Efficient removal of copper and silver ions in electroplating wastewater by magnetic-MOF-based hydrogel and a reuse case for photocatalytic application.
Adsorption
Heavy metal
Magnetic hydrogel
Photocatalytic
Resource utilization
Journal
Chemosphere
ISSN: 1879-1298
Titre abrégé: Chemosphere
Pays: England
ID NLM: 0320657
Informations de publication
Date de publication:
Nov 2023
Nov 2023
Historique:
received:
30
06
2023
revised:
12
08
2023
accepted:
18
08
2023
medline:
11
9
2023
pubmed:
22
8
2023
entrez:
21
8
2023
Statut:
ppublish
Résumé
Direct discharge of electroplating wastewater containing hazardous metal ions such as Cu
Identifiants
pubmed: 37604344
pii: S0045-6535(23)02154-9
doi: 10.1016/j.chemosphere.2023.139885
pii:
doi:
Substances chimiques
Copper
789U1901C5
Silver
3M4G523W1G
UiO-66
0
Wastewater
0
Hydrogels
0
Ions
0
Chitosan
9012-76-4
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
139885Informations de copyright
Copyright © 2023 Elsevier Ltd. All rights reserved.
Déclaration de conflit d'intérêts
Declaration of competing interest The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.