Wetting Behavior of A


Journal

Langmuir : the ACS journal of surfaces and colloids
ISSN: 1520-5827
Titre abrégé: Langmuir
Pays: United States
ID NLM: 9882736

Informations de publication

Date de publication:
17 Oct 2023
Historique:
medline: 2 10 2023
pubmed: 2 10 2023
entrez: 2 10 2023
Statut: ppublish

Résumé

To form nanopatterns with self-assembled block copolymers (BCPs), it is desirable to have through-film domains that are oriented perpendicular to the substrate. The domain orientation is determined by the interfacial interactions of the BCP domains with the substrate and with the free surface. Here, we use thin films of two different sets of BCPs with A

Identifiants

pubmed: 37782843
doi: 10.1021/acs.langmuir.3c02065
pmc: PMC10586369
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

14688-14698

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Auteurs

Hongbo Feng (H)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.

Benjamin Kash (B)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.

Soonmin Yim (S)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.

Kushal Bagchi (K)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.

Gordon S W Craig (GSW)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.

Wen Chen (W)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.

Stuart J Rowan (SJ)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.
Department of Chemistry, University of Chicago, 5735 S. Ellis Avenue, Chicago, Illinois 60637, United States.
Chemical Sciences and Engineering Division, Argonne National Laboratory, 9700 S. Cass Avenue, Lemont, Illinois 60439, United States.

Paul F Nealey (PF)

Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, United States.
Center for Molecular Engineering, Materials Science Division, Argonne National Laboratory, 9700 S. Cass Avenue, Lemont, Illinois 60439, United States.

Classifications MeSH