Improving Strain-localized GaSe Single Photon Emitters with Electrical Doping.

Fermi level electrostatic doping gallium selenide single photon emission strain engineering two-dimensional materials

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
08 Nov 2023
Historique:
medline: 25 10 2023
pubmed: 25 10 2023
entrez: 25 10 2023
Statut: ppublish

Résumé

Exciton localization through nanoscale strain has been used to create highly efficient single-photon emitters (SPEs) in 2D materials. However, the strong Coulomb interactions between excitons can lead to nonradiative recombination through exciton-exciton annihilation, negatively impacting SPE performance. Here, we investigate the effect of Coulomb interactions on the brightness, single photon purity, and operating temperatures of strain-localized GaSe SPEs by using electrostatic doping. By gating GaSe to the charge neutrality point, the exciton-exciton annihilation nonradiative pathway is suppressed, leading to ∼60% improvement of emission intensity and an enhancement of the single photon purity

Identifiants

pubmed: 37879097
doi: 10.1021/acs.nanolett.3c02308
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

9740-9747

Auteurs

Weijun Luo (W)

Department of Chemistry, Boston University, Boston, Massachusetts 02215, United States.

Alexander Puretzky (A)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States.

Benjamin Lawrie (B)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States.
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States.

Qishuo Tan (Q)

Department of Chemistry, Boston University, Boston, Massachusetts 02215, United States.

Hongze Gao (H)

Department of Chemistry, Boston University, Boston, Massachusetts 02215, United States.

Anna K Swan (AK)

Department of Electrical Engineering, Boston University, Boston, Massachusetts 02215, United States.
The Photonics Center, Boston University, Boston, Massachusetts 02215, United States.
Division of Materials Science and Engineering, Boston University, Boston, Massachusetts 02215, United States.

Liangbo Liang (L)

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States.

Xi Ling (X)

Department of Chemistry, Boston University, Boston, Massachusetts 02215, United States.
The Photonics Center, Boston University, Boston, Massachusetts 02215, United States.
Division of Materials Science and Engineering, Boston University, Boston, Massachusetts 02215, United States.

Classifications MeSH