Gate Controlled Excitonic Emission in Quantum Dot Thin Films.

carrier lifetime exciton ionic gating quantum dot trion

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
22 Nov 2023
Historique:
medline: 7 11 2023
pubmed: 7 11 2023
entrez: 7 11 2023
Statut: ppublish

Résumé

Formation of charged trions is detrimental to the luminescence quantum efficiency of colloidal quantum dot (QD) thin films as they predominantly undergo nonradiative recombination. In this regard, control of charged trion formation is of interest for both fundamental characterization of the quasi-particles and performance optimization. Using CdSe/CdS QDs as a prototypical material system, here we demonstrate a metal-oxide-semiconductor capacitor based on QD thin films for studying the background charge effect on the luminescence efficiency and lifetime. The concentration ratio of the charged and neutral quasiparticles in the QDs is reversibly controlled by applying a gate voltage, while simultaneous steady-state and time-resolved photoluminescence measurements are performed. Notably, the photoluminescence intensity is modulated by up to 2 orders of magnitude with a corresponding change in the effective lifetime. In addition, chip-scale modulation of brightness is demonstrated, where the photoluminescence is effectively turned on and off by the gate, highlighting potential applications in voltage-controlled electrochromics.

Identifiants

pubmed: 37934978
doi: 10.1021/acs.nanolett.3c02456
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

10164-10170

Auteurs

I K M Reaz Rahman (IKMR)

Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Shiekh Zia Uddin (SZ)

Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Matthew Yeh (M)

Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Naoki Higashitarumizu (N)

Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Jongchan Kim (J)

Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Quanwei Li (Q)

Department of Chemistry, University of California, Berkeley, California 94720, United States.
Kavli Energy Nanoscience Institute at Berkeley, Berkeley, California 94720, United States.

Hyeonjun Lee (H)

Department of Energy Science and Centre for Artificial Atoms, Sungkyunkwan University, Natural Sciences Campus, Seobu-ro 2066, Jangan-gu, Suwon 16419, Gyeonggi-do, Republic of Korea.

Kyuho Lee (K)

Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.
Materials Science and Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Republic of Korea.

HoYeon Kim (H)

Materials Science and Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Republic of Korea.

Cheolmin Park (C)

Materials Science and Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Republic of Korea.

Jaehoon Lim (J)

Department of Energy Science and Centre for Artificial Atoms, Sungkyunkwan University, Natural Sciences Campus, Seobu-ro 2066, Jangan-gu, Suwon 16419, Gyeonggi-do, Republic of Korea.

Joel W Ager (JW)

Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.
Materials Science and Engineering, University of California, Berkeley, California 94720, United States.

Ali Javey (A)

Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Classifications MeSH