Case of the Bromine Vacancy in Cs


Journal

The journal of physical chemistry letters
ISSN: 1948-7185
Titre abrégé: J Phys Chem Lett
Pays: United States
ID NLM: 101526034

Informations de publication

Date de publication:
23 Nov 2023
Historique:
medline: 12 11 2023
pubmed: 12 11 2023
entrez: 12 11 2023
Statut: ppublish

Résumé

Typically defect tolerance is equated with a lack of deleterious defects or with abundant defects creating only shallow levels. Here, we address the idea that deep defects, when unavoidable, do not guarantee harmful consequences. Using halogen vacancy as a common defect among halides, we explore its behavior in Cs

Identifiants

pubmed: 37952164
doi: 10.1021/acs.jpclett.3c02732
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

10378-10381

Auteurs

Byungkyun Kang (B)

Department of Chemistry and Physics, Arkansas State University, State University, Arkansas 72467, United States.

Koushik Biswas (K)

Department of Chemistry and Physics, Arkansas State University, State University, Arkansas 72467, United States.

Classifications MeSH