Relativistic ultrafast electron diffraction at high repetition rates.


Journal

Structural dynamics (Melville, N.Y.)
ISSN: 2329-7778
Titre abrégé: Struct Dyn
Pays: United States
ID NLM: 101660872

Informations de publication

Date de publication:
Nov 2023
Historique:
received: 12 07 2023
accepted: 08 11 2023
medline: 7 12 2023
pubmed: 7 12 2023
entrez: 7 12 2023
Statut: epublish

Résumé

The ability to resolve the dynamics of matter on its native temporal and spatial scales constitutes a key challenge and convergent theme across chemistry, biology, and materials science. The last couple of decades have witnessed ultrafast electron diffraction (UED) emerge as one of the forefront techniques with the sensitivity to resolve atomic motions. Increasingly sophisticated UED instruments are being developed that are aimed at increasing the beam brightness in order to observe structural signatures, but so far they have been limited to low average current beams. Here, we present the technical design and capabilities of the HiRES (High Repetition-rate Electron Scattering) instrument, which blends relativistic electrons and high repetition rates to achieve orders of magnitude improvement in average beam current compared to the existing state-of-the-art instruments. The setup utilizes a novel electron source to deliver femtosecond duration electron pulses at up to MHz repetition rates for UED experiments. Instrument response function of sub-500 fs is demonstrated with < 100 fs time resolution targeted in future. We provide example cases of diffraction measurements on solid-state and gas-phase samples, including both micro- and nanodiffraction (featuring 100 nm beam size) modes, which showcase the potential of the instrument for novel UED experiments.

Identifiants

pubmed: 38058995
doi: 10.1063/4.0000203
pii: 4.0000203
pmc: PMC10697722
doi:

Types de publication

Journal Article

Langues

eng

Pagination

064302

Informations de copyright

© 2023 Author(s).

Déclaration de conflit d'intérêts

The authors have no conflicts to disclose.

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Auteurs

K M Siddiqui (KM)

Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

F Ji (F)

Accelerator Technology and Applied Physics Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

S Paiagua (S)

Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, USA.

C Ophus (C)

National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

N C Andresen (NC)

Engineering Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

L Jin (L)

Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, California 94720, USA.

J Wu (J)

Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, California 94720, USA.

S Wang (S)

Department of Electrical Engineering and Computer Sciences, University of California at Berkeley, Berkeley, California 94720, USA.

X Zhang (X)

Department of Mechanical Engineering, University of California at Berkeley, Berkeley, California 94720, USA.

W You (W)

Department of Physics and JILA, University of Colorado and NIST, Boulder, Colorado 80309, USA.

M Murnane (M)

Department of Physics and JILA, University of Colorado and NIST, Boulder, Colorado 80309, USA.

M Centurion (M)

Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, USA.

X Wang (X)

Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, USA.

D S Slaughter (DS)

Chemical Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd., Berkeley, California 94720, USA.

P Musumeci (P)

Department of Physics and Astronomy, University of California Los Angeles, Los Angeles, California 90095, USA.

D Filippetto (D)

Accelerator Technology and Applied Physics Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.

Classifications MeSH