The impact of chitosan in experimental resin with different photoinitiator systems.

Antimicrobial Chitosan Photoinitiators Resin

Journal

Journal of the mechanical behavior of biomedical materials
ISSN: 1878-0180
Titre abrégé: J Mech Behav Biomed Mater
Pays: Netherlands
ID NLM: 101322406

Informations de publication

Date de publication:
18 Dec 2023
Historique:
received: 23 10 2023
revised: 06 12 2023
accepted: 11 12 2023
medline: 22 12 2023
pubmed: 22 12 2023
entrez: 22 12 2023
Statut: aheadofprint

Résumé

to investigate the effect of different concentrations of chitosan added to experimental resins containing either BAPO or camphorquinone (CQ) as photoinitiators, regarding degree of conversion (DC), flexural strength (FS), flexural elastic modulus (E), Knoop microhardness (KHN), cytotoxicity, genotoxicity and antimicrobial activity. Experimental resins with polymeric matrix of BisGMA and TEGDMA was added either 0.5 wt% BAPO or 0.5 wt% camphorquinone/0.2% amine along with and chitosan concentrations of 0.5%; 1.0% or 2.0%. Degree of conversion was measured using Fourier transformed infrared spectroscopy. Flexural strength and elastic modulus were obtained through three-point bending test and Knoop microhardness was measured in a microidenter. Direct cytotoxicity was performed in human keratinocytes and genotoxicity test was done in murine macrophages cells. Antimicrobial activity was acessed against Staphylococcus aureus and Streptococcus mutans through the inhibition halo. Data were analyzed using two-way ANOVA and Tukey teste (α = 0.05). The materials containing photoinitiator BAPO showed higher values of DC, FS, E, and KHN compared to resins with CQ. The addition of chitosan did not affect the properties of these materials. However, in resins containing CQ, the addition of chitosan improve these properties compared to control group. For the groups containing BAPO the chitosan reduced cytotoxicity and genotoxicity compared to materials with camphorquinone. The materials with 1.0% and 2.0% chitosan showed increased antibacterial activity in the materials containing BAPO as photoinitiator for both bacteria. The alternative photoinitiator BAPO and chitosan can improve physical and biological properties of photoactivated resins when compared with the materials with photoinitiator camphorquinone.

Identifiants

pubmed: 38134585
pii: S1751-6161(23)00677-X
doi: 10.1016/j.jmbbm.2023.106323
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

106323

Informations de copyright

Copyright © 2023 Elsevier Ltd. All rights reserved.

Déclaration de conflit d'intérêts

Declaration of competing interest The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Auteurs

Isaías Donizeti Silva (ID)

Dental School, University of Santo Amaro, Rua Professor Eneas de Siqueira Neto, 340, CEP: 04829-900, São Paulo, Brazil. Electronic address: isaiasdonizeti@gmail.com.

Letícia Cristina Cidreira Boaro (LCC)

College of Dentistry, University of Saskatchewan, Dental Clinic Building, 105, Wiggins Road, Saskatoon, SK, S7N 5E4, Canada. Electronic address: leticiacidreiraboaro@gmail.com.

Bruno Vilela Muniz (BV)

Itapeva Faculty of Social and Agrarian Sciences, Pilão dágua -Rod. Francsco Alves Negrão, Km 285, CEP 18412-000, Itapeva, São Paulo, Brazil. Electronic address: bruno.vilela@professor.fait.edu.br.

Karina Cogo-Muller (K)

Faculty of Pharmaceutical Sciences, University of Campinas, Rua Candido Portinari, 200, CEP: 13083-871, Campinas, Brazil. Electronic address: karicogo@hotmail.com.

Flávia Gonçalves (F)

Dental School, University of Santo Amaro, Rua Professor Eneas de Siqueira Neto, 340, CEP: 04829-900, São Paulo, Brazil. Electronic address: flgoncalves@prof.unisa.br.

William Cunha Brandt (WC)

Dental School, University of Santo Amaro, Rua Professor Eneas de Siqueira Neto, 340, CEP: 04829-900, São Paulo, Brazil. Electronic address: wcbrandt@prof.unisa.br.

Classifications MeSH