Progress in Gallium Oxide Field-Effect Transistors for High-Power and RF Applications.

RF defects field-effect transistors (FETs) gallium oxide high power wide-bandgap semiconductor

Journal

Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929

Informations de publication

Date de publication:
18 Dec 2023
Historique:
received: 30 10 2023
revised: 21 11 2023
accepted: 23 11 2023
medline: 23 12 2023
pubmed: 23 12 2023
entrez: 23 12 2023
Statut: epublish

Résumé

Power electronics are becoming increasingly more important, as electrical energy constitutes 40% of the total primary energy usage in the USA and is expected to grow rapidly with the emergence of electric vehicles, renewable energy generation, and energy storage. New materials that are better suited for high-power applications are needed as the Si material limit is reached. Beta-phase gallium oxide (β-Ga

Identifiants

pubmed: 38138834
pii: ma16247693
doi: 10.3390/ma16247693
pii:
doi:

Types de publication

Journal Article Review

Langues

eng

Subventions

Organisme : George Mason University
ID : Presidential Scholarship
Organisme : Virginia Microelectronics Consortium (VMEC)
ID : Chair Professorship

Auteurs

Ory Maimon (O)

Department of Electrical Engineering, George Mason University, Fairfax, VA 22030, USA.
Nanoscale Device and Characterization Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.

Qiliang Li (Q)

Department of Electrical Engineering, George Mason University, Fairfax, VA 22030, USA.
Nanoscale Device and Characterization Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
Quantum Science & Engineering Center, George Mason University, Fairfax, VA 22030, USA.

Classifications MeSH