Removal of phase residues in electron holography.

Gaussian process regression electron holography image denoising nanoparticles phase residue sparse modeling

Journal

Microscopy (Oxford, England)
ISSN: 2050-5701
Titre abrégé: Microscopy (Oxf)
Pays: England
ID NLM: 101595834

Informations de publication

Date de publication:
20 Dec 2023
Historique:
received: 13 06 2023
revised: 31 10 2023
accepted: 18 12 2023
medline: 18 1 2024
pubmed: 18 1 2024
entrez: 18 1 2024
Statut: aheadofprint

Résumé

Electron holography provides quantitative phase information regarding the electromagnetic fields and the morphology of micro- to nano-scale samples. A phase image reconstructed numerically from an electron hologram sometimes includes phase residues, i.e. origins of unremovable phase discontinuities, which make it much more difficult to quantitatively analyze local phase values. We developed a method to remove the residues in a phase image by a combination of patching local areas of a hologram and denoising based on machine learning. The small patches for a hologram, which were generated using the spatial frequency information of the own fringe patterns, were pasted at each residue point by an algorithm based on sparse modeling. After successive phase reconstruction, the phase components with no dependency on the vicinity were filtered out by Gaussian process regression. We determined that the phase discontinuities that appeared around phase residues were removed and the phase distributions of an atomic resolution phase image of a Pt nanoparticle were sufficiently restored.

Identifiants

pubmed: 38236158
pii: 7484464
doi: 10.1093/jmicro/dfad062
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Subventions

Organisme : Innovative Science and Technology Initiative for Security Grant
ID : JPJ004596
Organisme : Innovative Science and Technology Initiative for Security Grant
ID : JPJ004596

Informations de copyright

© The Author(s) 2024. Published by Oxford University Press on behalf of The Japanese Society of Microscopy. All rights reserved. For permissions, please e-mail: journals.permissions@oup.com.

Auteurs

Yoshio Takahashi (Y)

Research & Development Group, Hitachi, Ltd., Hatoyama, Saitama 350-0395, Japan.

Tetsuya Akashi (T)

Research & Development Group, Hitachi, Ltd., Hatoyama, Saitama 350-0395, Japan.

Toshiaki Tanigaki (T)

Research & Development Group, Hitachi, Ltd., Hatoyama, Saitama 350-0395, Japan.

Classifications MeSH