Comparison of Different Cooling Schemes for AlGaN/GaN High-Electron Mobility Transistors.

AlGaN/GaN HEMTs chip-embedded cooling hotspot near-chip cooling remote cooling

Journal

Micromachines
ISSN: 2072-666X
Titre abrégé: Micromachines (Basel)
Pays: Switzerland
ID NLM: 101640903

Informations de publication

Date de publication:
23 Dec 2023
Historique:
received: 25 11 2023
revised: 19 12 2023
accepted: 21 12 2023
medline: 23 1 2024
pubmed: 23 1 2024
entrez: 23 1 2024
Statut: epublish

Résumé

Cooling is important for AlGaN/GaN high-electron mobility transistors (HEMTs) performance. In this paper, the advantages and disadvantages of the cooling performance of three cooling schemes: remote cooling (R-cool), near-chip cooling (NC-cool), and chip-embedded cooling (CE-cool) are compared. The influences of distinct geometric parameters and operating conditions on thermal resistance are investigated. The results show that the thermal resistances of NC-cool and CE-cool are almost the same as each other. Decreasing microchannel base thickness (

Identifiants

pubmed: 38258152
pii: mi15010033
doi: 10.3390/mi15010033
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : National Natural Science Foundation of China
ID : 62104249
Organisme : Youth Innovation Promotion Association
ID : 2023126

Auteurs

Yunqian Song (Y)

Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.
University of Chinese Academy of Sciences, Beijing 100049, China.
State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.
Leihua Electronic Technology Research Institute AVIC, Wuxi 214063, China.

Chuan Chen (C)

Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.
State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.

Qidong Wang (Q)

Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.
State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.

Jianyu Feng (J)

Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.
University of Chinese Academy of Sciences, Beijing 100049, China.
State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.

Rong Fu (R)

Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.
State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.

Xiaobin Zhang (X)

Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.

Liqiang Cao (L)

Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.
University of Chinese Academy of Sciences, Beijing 100049, China.
State Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.

Classifications MeSH