Analysis of nitrogen source assimilation in industrial strains of Aspergillus oryzae.

Aspergillus oryzae Industrial strains Nitrate assimilation pathway Nitrate transporter Nitrogen source assimilation crnA

Journal

Journal of bioscience and bioengineering
ISSN: 1347-4421
Titre abrégé: J Biosci Bioeng
Pays: Japan
ID NLM: 100888800

Informations de publication

Date de publication:
Apr 2024
Historique:
received: 02 11 2023
revised: 22 12 2023
accepted: 07 01 2024
pubmed: 13 2 2024
medline: 13 2 2024
entrez: 12 2 2024
Statut: ppublish

Résumé

Nitrogen source assimilation is important for the biological functions of fungi, and its pathway has been deeply studied. Aspergillus oryzae mutants defective in nitrogen source assimilation are known to grow poorly on Czapek-Dox (CD) medium. In this study, we found an industrial strain of A. oryzae that grew very poorly on a CD medium containing sodium nitrate as a nitrogen source. We used media with various nitrogen components to examine the steps affecting the nitrogen source assimilation pathway of this strain. The strain grew well on the CD medium supplied with nitrite salt or ammonium salt, suggesting that the strain was defective in nitrate assimilation step. To ascertain the gene causing the defect of nitrate assimilation, a gene expression vector harboring either niaD or crnA of A. oryzae RIB40 was introduced into the industrial strain. The industrial strain containing the crnA vector recovered its growth. This is the first report that a mutation of crnA causes poor growth on CD medium in an industrial strain of A. oryzae, and crnA can be used as a transformation marker for crnA deficient strains.

Identifiants

pubmed: 38346913
pii: S1389-1723(24)00003-3
doi: 10.1016/j.jbiosc.2024.01.003
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

231-238

Informations de copyright

Copyright © 2024 The Society for Biotechnology, Japan. Published by Elsevier B.V. All rights reserved.

Auteurs

Shouhei Miki (S)

Higuchi Matsunosuke Shoten Co., Ltd., 1-14-2 Harimacho, Abeno-ku, Osaka-shi, Osaka 545-0022, Japan; Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan.

Kanae Sakai (K)

Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan.

Takuro Nakagawa (T)

Higuchi Matsunosuke Shoten Co., Ltd., 1-14-2 Harimacho, Abeno-ku, Osaka-shi, Osaka 545-0022, Japan.

Takumi Tanaka (T)

Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan.

Liyun Liu (L)

Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan.

Hideyuki Yamashita (H)

Higuchi Matsunosuke Shoten Co., Ltd., 1-14-2 Harimacho, Abeno-ku, Osaka-shi, Osaka 545-0022, Japan.

Ken-Ichi Kusumoto (KI)

Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan. Electronic address: kenichi_kusumoto@bio.eng.osaka-u.ac.jp.

Classifications MeSH