New Theoretical Model to Describe Carrier Multiplication in Semiconductors: Explanation of Disparate Efficiency in MoTe


Journal

The journal of physical chemistry. C, Nanomaterials and interfaces
ISSN: 1932-7447
Titre abrégé: J Phys Chem C Nanomater Interfaces
Pays: United States
ID NLM: 101299949

Informations de publication

Date de publication:
07 Mar 2024
Historique:
received: 18 01 2024
revised: 16 02 2024
accepted: 20 02 2024
medline: 13 3 2024
pubmed: 13 3 2024
entrez: 13 3 2024
Statut: epublish

Résumé

We present a theoretical model to compute the efficiency of the generation of two or more electron-hole pairs in a semiconductor by the absorption of one photon via the process of carrier multiplication (CM). The photogeneration quantum yield of electron-hole pairs is calculated from the number of possible CM decay pathways of the electron and the hole. We apply our model to investigate the underlying cause of the high efficiency of CM in bulk 2H-MoTe

Identifiants

pubmed: 38476826
doi: 10.1021/acs.jpcc.4c00383
pmc: PMC10926152
doi:

Types de publication

Journal Article

Langues

eng

Pagination

3693-3702

Informations de copyright

© 2024 The Authors. Published by American Chemical Society.

Déclaration de conflit d'intérêts

The authors declare no competing financial interest.

Auteurs

Sven Weerdenburg (S)

Chemical Engineering Department, Delft University of Technology, Van der Maasweg 9, Delft 2629 HZ, The Netherlands.

Nisha Singh (N)

Chemical Engineering Department, Delft University of Technology, Van der Maasweg 9, Delft 2629 HZ, The Netherlands.

Marco van der Laan (M)

Institute of Physics, University of Amsterdam, Amsterdam 1098 XH, The Netherlands.

Sachin Kinge (S)

Materials Research & Development, Toyota Motor Europe, Zaventem B1930, Belgium.

Peter Schall (P)

Institute of Physics, University of Amsterdam, Amsterdam 1098 XH, The Netherlands.

Laurens D A Siebbeles (LDA)

Chemical Engineering Department, Delft University of Technology, Van der Maasweg 9, Delft 2629 HZ, The Netherlands.

Classifications MeSH