Photochemical formation of the elusive Dewar isomers of aromatic systems: why are substituted azaborines different?


Journal

Physical chemistry chemical physics : PCCP
ISSN: 1463-9084
Titre abrégé: Phys Chem Chem Phys
Pays: England
ID NLM: 100888160

Informations de publication

Date de publication:
26 Mar 2024
Historique:
medline: 26 3 2024
pubmed: 26 3 2024
entrez: 26 3 2024
Statut: aheadofprint

Résumé

Photochemical reactions enabling efficient transformation of aromatic systems into energetic but stable non-aromatic isomers have a long history in organic chemistry. One recently discovered reaction in this realm is that where derivatives of 1,2-azaborine, a compound isoelectronic with benzene in which two adjacent C atoms are replaced by B and N atoms, form the non-hexagon Dewar isomer. Here, we report quantum-chemical calculations that explain both why 1,2-azaborine is intrinsically more reactive toward Dewar formation than benzene, and how suitable substitutions at the B and N atoms are able to increase the corresponding quantum yield. We find that Dewar formation from 1,2-azaborine is favored by a pronounced driving force that benzene lacks, and that a large improvement in quantum yield arises when the reaction of substituted 1,2-azaborines proceeds without involvement of an intermediary ground-state species. Overall, we report new insights into making photochemical use of the Dewar isomers of aromatic compounds.

Identifiants

pubmed: 38529645
doi: 10.1039/d4cp00777h
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Auteurs

Enrique M Arpa (EM)

Division of Theoretical Chemistry, IFM, Linköping University, 58183 Linköping, Sweden. bodur@ifm.liu.se.
Institute of Organic Chemistry, RWTH Aachen University, 52056 Aachen, Germany. enrique.arpa@rwth-aachen.de.

Sven Stafström (S)

Division of Theoretical Physics, IFM, Linköping University, 58183 Linköping, Sweden.

Bo Durbeej (B)

Division of Theoretical Chemistry, IFM, Linköping University, 58183 Linköping, Sweden. bodur@ifm.liu.se.

Classifications MeSH